Manufacture and equipment of microporous structure using anodaizing method of titanium implant

The present invention is devised to solve the problems of the prior art in which the existing osseointergration rate is poor as described above. The problem to be solved in the present invention is to provide a manufacturing method for increasing the osseointergration rate by generating a microporous structure during anodizing treatment. The manufacturing method using titanium anodizing includes: a step of dipping a titanium material in a cleaning agent; a step of washing the cleaning agent; a step of immersing in acid; a step of washing acid; a step of anodizing titanium; a step of washing; and a step of drying hot air. 본 발명은 상기와 같은 기존의 골융합율이 저조한 종래 기술의 문제점을 해결하기 위하여 안출된 것으로서, 본 발명에서 해결하고자 하는 과제는 양극산화 처리시 미세다공 구조를 생성해 골융합율을 높이는 제조 방법을 제공하고자 한다.