Exposure Apparatus and Fine Metal Mask Manufacturing Method using the same

The present invention relates to an exposure apparatus capable of easily adjusting the width and angle of a light source, and a method for manufacturing a fine metal mask capable of manufacturing a fine metal mask without chemical treatment. To achieve the purpose of the present invention, the expos...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	HEUNGHWAN KIM, LIM GEUN TAEK, GWANGSEOK KIM, BOGSOO KIM
Format:	Patent
Sprache:	eng ; kor
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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