Mask frame assembly and manufacturing method thereof

An embodiment of the present invention discloses a mask frame assembly including: a mask with a pattern area for deposition; and a long side stick of a clad structure which divides the pattern area of the mask into a unit cell pattern and in which a relatively strong magnetic layer and a relatively...

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Bibliographische Detailangaben
Hauptverfasser:	AHN JUNG HYUN, MOON JAE SUK, LEE SEUNG JIN
Format:	Patent
Sprache:	eng ; kor
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CHEMICAL SURFACE TREATMENT CHEMISTRY CINEMATOGRAPHY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL ELECTRICITY ELECTROGRAPHY HOLOGRAPHY INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL MATERIALS THEREFOR METALLURGY ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
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Beschreibung
Zusammenfassung:	An embodiment of the present invention discloses a mask frame assembly including: a mask with a pattern area for deposition; and a long side stick of a clad structure which divides the pattern area of the mask into a unit cell pattern and in which a relatively strong magnetic layer and a relatively weak magnetic layer are stacked. In the present invention, the long side stick can maintain force to adhere the mask to a substrate at an appropriate level, not excessive or weak, so that deposition defects can be sufficiently suppressed. 본 발명의 일 실시예는 증착을 위한 패턴영역이 구비된 마스크와, 마스크의 패턴영역을 단위셀 패턴으로 구획하며 상대적인 강자성층과 상대적인 약자성층이 적층된 클래드 구조의 장변스틱을 포함하는 마스크 프레임 조립체를 개시한다.