FILM FORMATION APPARATUS

Provided is a film forming device with excellent cooling efficiency of a workpiece, which comprises: a carry-in/out unit (100) for discharging and introducing a workpiece (W) from/to the inside of a chamber (2); a rotating body (3) disposed inside the chamber (2), and conveying a susceptor (S) mount...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: TAKEUCHI HACHIYA, TAKIZAWA YOJI
Format: Patent
Sprache:eng ; kor
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Beschreibung
Zusammenfassung:Provided is a film forming device with excellent cooling efficiency of a workpiece, which comprises: a carry-in/out unit (100) for discharging and introducing a workpiece (W) from/to the inside of a chamber (2); a rotating body (3) disposed inside the chamber (2), and conveying a susceptor (S) mounted with the workpiece (W) by rotation; a plurality of processing units (PR) disposed along the circumference around a rotary shaft of the rotating body (3), having an opening (OP) in communication with the inside of the chamber (2), and processing the workpiece (W) introduced from the opening (OP); and a pusher (500) for pushing the susceptor (S) in a direction in which the workpiece (W) is separated from the rotating body (3) to be introduced into the processing units (PR) from the opening (OP). The processing units (PR) include a heating unit (200) for heating the workpiece (W), a film forming unit (300) for forming a film on the workpiece (W), and a cooling unit (400) for cooling the workpiece (W). The rotating body (3) is provided with a holding unit (33) for holding the susceptor (S) conveyed by the rotating body (3), and opening the susceptor (S) by being pushed by the pusher (500). The pusher (500) is provided with a sealing unit (520) for introducing the workpiece (W) into the processing units (PR) and sealing the opening (OP). 워크의 냉각 효율이 우수한 성막 장치를 제공한다. 워크(W)를 챔버(2)의 내부에 출납하는 반입반출부(100)와, 챔버(2)의 내부에 배치되며, 워크(W)를 탑재한 서셉터(S)를 회전에 의해 반송하는 회전체(3)와, 회전체(3)의 회전축을 중심으로 하는 원주를 따라 배치되며, 챔버(2) 내에 연통된 개구(OP)를 가지고, 개구(OP)로부터 도입된 워크(W)를 처리하는 복수의 처리부(PR)와, 워크(W)가 회전체(3)로부터 이탈하여, 개구(OP)로부터 처리부(PR) 내에 도입되는 방향으로 서셉터(S)를 밀어붙이는 푸셔(500)를 가지고, 복수의 처리부(PR)는, 워크(W)를 가열하는 가열부(200)와, 워크(W)에 대하여 성막하는 성막부(300)와, 워크(W)를 냉각하는 냉각부(400)를 포함하고, 회전체(3)에는, 회전체(3)가 반송하고 있는 서셉터(S)를 유지하며, 푸셔(500)에 의해 밀어붙여짐으로써 서셉터(S)를 개방하는 유지부(33)가 마련되고, 푸셔(500)에는, 처리부(PR)에 워크(W)를 도입하고 개구(OP)를 밀봉하는 밀봉부(520)가 마련되어 있다.