Apparatus and Method for treating substrate

The present invention provides an apparatus for treating a substrate and a method thereof. The apparatus for treating a substrate comprises: a plurality of chambers separated from each other and including a treating space therein to treat the substrate; a liquid supply unit located at the treating s...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	KWON SOON KAB, PARK SOO YOUNG, CHOO YOUNG HO, LEE JIHYUN
Format:	Patent
Sprache:	eng ; kor
Schlagworte:	BASIC ELECTRIC ELEMENTS CONTROL OR REGULATING SYSTEMS IN GENERAL CONTROLLING ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY FUNCTIONAL ELEMENTS OF SUCH SYSTEMS MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS ORELEMENTS PHYSICS REGULATING SEMICONDUCTOR DEVICES
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