SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS

Provided are a substrate processing method for stable substrate processing and a substrate processing device. According to an embodiment of the present invention, the substrate processing method comprises: a generation process of generating recipe information in substrate processing and control valu...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	YOSHIDA HIROSHI, KAWAZU TAKAHIRO
Format:	Patent
Sprache:	eng ; kor
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
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