Exhaust assembly and Apparatus for treating substrate with the assembly

The present invention provides an apparatus through which a fluid flows. According to the present invention, a substrate treating apparatus comprises a chamber and an exhaust assembly for exhausting the interior of the chamber. The exhaust assembly includes: a piping with an internal passage; an ope...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: JANG YOUNG JIN, KIM JONG HAN, SONG GIL HUN, KIM YOUNG JIN, JEONG CHEOL HWAN
Format: Patent
Sprache:eng ; kor
Schlagworte:
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Zusammenfassung:The present invention provides an apparatus through which a fluid flows. According to the present invention, a substrate treating apparatus comprises a chamber and an exhaust assembly for exhausting the interior of the chamber. The exhaust assembly includes: a piping with an internal passage; an opening and closing member installed in the piping and opening and closing the internal passage; and a driving member which drives the opening and closing member to open and close the internal passage. The opening and closing member includes a first plate capable of blocking the internal passage and a second plate coupled to the first plate. The second plate has a smaller area than the first plate, and the first plate and the second plate are made of different materials. 본 발명은 유체가 흐르는 장치를 제공한다. 기판을 처리하는 장치는 챔버 및 상기 챔버의 내부를 배기하는 배기 어셈블리를 포함하되, 상기 배기 어셈블리는 내부 통로를 가지는 배관, 상기 배관에 설치되며, 상기 내부 통로를 개폐하는 개폐 부재, 그리고 상기 내부 통로가 개폐되도록 상기 개폐 부재를 구동시키는 구동 부재를 포함하되, 상기 개폐 부재는 상기 내부 통로를 차단 가능한 제1판과 상기 제1판에 결합되는 제2판을 포함하되, 상기 제2판은 상기 제1판에 비해 작은 면적을 가지고, 상기 제1판과 상기 제2판은 서로 다른 재질로 제공된다.