METHOD OF COATING SUBSTRATES

The present invention relates to a method for determining the velocity profile at which a substrate to be coated moves relative to a coating source. The method comprises the steps of: (a) describing a deposition rate which is dependent on substrate coordinates and a position of the substrate relative to the coating source by an approximation function comprising several parameters; (b) describing the velocity profile to be determined by an approximation function comprising one or more parameters; (c) coating the substrate using the defined velocity profile, wherein the coated substrate is moved relative to the coating source in a straight line along the first direction using the velocity profile during the coating operation; (d) measuring the actual layer thickness profile of the coated substrate achieved by the coating operation; (e) determining one or more of the parameters of the approximate function for the deposition rate based on the comparison of the measured actual layer thickness profile and the defined target layer thickness profile; and (f) determining the velocity profile by determining one or more of the parameters of the approximate function for the velocity profile to be determined based on the parameter(s) determined in step (e). 본 발명은 코팅될 기판이 코팅 소스에 대해 이동하는 속도 프로파일을 결정하는 방법에 관한 것이다.