PELLICLE AND METHOD FOR PRODUCING THE SAME

An objective of the present invention is to provide a pellicle in which strength of a pellicle film is improved, and a vibration of the pellicle film due to a high-speed scanning operation during exposure is reduced so as to suppress deterioration of overlay. According to the present invention, the...

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Bibliographische Detailangaben
1. Verfasser:	NISHIMURA AKINORI
Format:	Patent
Sprache:	eng ; kor
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:	An objective of the present invention is to provide a pellicle in which strength of a pellicle film is improved, and a vibration of the pellicle film due to a high-speed scanning operation during exposure is reduced so as to suppress deterioration of overlay. According to the present invention, the pellicle includes: a pellicle film; and a pellicle frame on which the pellicle film is stretched and installed, wherein the pellicle film is an annealed pellicle film. In addition, a method of manufacturing a pellicle by stretching and installing a pellicle film on a pellicle frame includes: annealing the pellicle film alone before stretching and installing the pellicle film on the pellicle frame; annealing the pellicle after stretching and installing the pellicle film; or annealing the pellicle film alone and the pellicle before and after stretching and installing the pellicle film. (과제) 본 발명의 목적은 펠리클막의 강도를 향상시키고, 노광시의 고속 스캔 운동에 의한 펠리클막의 진동을 완화하여, 오버레이 악화를 억제할 수 있는 펠리클을 제공하는 것이다. (해결수단) 본 발명은 펠리클막이 펠리클 프레임에 장설된 펠리클로서, 상기 펠리클막이 어닐 처리를 실시한 펠리클막인 것을 특징으로 하는 펠리클, 및 펠리클막을 펠리클 프레임에 장설해서 펠리클을 제조하는 방법으로서, 상기 펠리클막을 펠리클 프레임에 장설하기 전에 상기 펠리클막 단체를 어닐 처리하는 공정, 상기 펠리클막의 장설 후에 펠리클을 어닐 처리하는 공정, 또는 상기 펠리클막의 장설 전 및 장설 후의 양쪽에서 펠리클막 단체 및 펠리클을 어닐 처리하는 공정을 갖는 것을 특징으로 하는 펠리클의 제조 방법을 제공한다.