method for drying substrate photoresist developing method and photolithography method using the same

The present invention provides a substrate drying method, a photoresist development method, and a photolithography method. The drying method comprises a step of providing a drying liquid on a substrate; a step of generating a supercritical fluid by increasing pressure of the drying liquid; and a ste...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	LEE KUNTACK, KIM YOUNG HOO, LEE HYOSAN, CHO YONG JHIN, CHOI SOO YOUNG, KOH CHAWON, PARK SUNGHYUN, CHA JI HOON
Format:	Patent
Sprache:	eng ; kor
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES
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