method for drying substrate photoresist developing method and photolithography method using the same

The present invention provides a substrate drying method, a photoresist development method, and a photolithography method. The drying method comprises a step of providing a drying liquid on a substrate; a step of generating a supercritical fluid by increasing pressure of the drying liquid; and a ste...

Ausführliche Beschreibung

Gespeichert in:

Bibliographische Detailangaben
Hauptverfasser:	LEE KUNTACK, KIM YOUNG HOO, LEE HYOSAN, CHO YONG JHIN, CHOI SOO YOUNG, KOH CHAWON, PARK SUNGHYUN, CHA JI HOON
Format:	Patent
Sprache:	eng ; kor
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES
Online-Zugang:	Volltext bestellen
Tags:	Tag hinzufügen Keine Tags, Fügen Sie den ersten Tag hinzu!

Beschreibung
Zusammenfassung:	The present invention provides a substrate drying method, a photoresist development method, and a photolithography method. The drying method comprises a step of providing a drying liquid on a substrate; a step of generating a supercritical fluid by increasing pressure of the drying liquid; and a step of removing the supercritical fluid to dry the substrate. According to the present invention, collapse defects of photoresist patterns can be minimized or prevented. 본 발명은 기판 건조 방법, 포토레지스트 현상 방법, 및 포토리소그래피 방법을 개시한다. 그의 건조 방법은, 기판 상에 건조 액체를 제공하는 단계와, 상기 건조 액체의 압력을 증가시켜 초임계 유체를 생성하는 단계와, 상기 초임계 유체를 제거하여 상기 기판을 건조하는 단계를 포함한다.