SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD

The present invention provides a substrate processing device and a substrate processing method which can heat a substrate while rotating the substrate with a simple configuration. The substrate processing device comprises: a substrate holding and rotating unit holding and rotating a substrate on a m...

Ausführliche Beschreibung

Bibliographische Detailangaben

1. Verfasser:	SEKIMOTO EIICHI
Format:	Patent
Sprache:	eng ; kor
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
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