APPARATUS FOR TREATING SUBSTRATE SUPPROTING UNIT AND SUBSTRATE AND METHOD FOR TREATING SUBSTRATE

Provided is an apparatus for processing a substrate. According to one embodiment, the apparatus for processing a substrate comprises: a housing having a processing space formed therein; a support unit supporting a substrate in the processing space; a process gas supply unit supplying process gas to...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	HA KANG RAE, LEE SANG KEE
Format:	Patent
Sprache:	eng ; kor
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
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