Substrate treatment apparatus and substrate treatment method

A substrate processing apparatus of the present disclosure includes: a table on which a semiconductor element is seated; and a heating unit which is spaced apart from the table, and generates heat. The substrate processing apparatus can improve the reliability of removing moisture remaining in the s...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	LEE YONG HYUN, KIM JIN SOO, SHIN KUM SU, LEE SEOK JIN
Format:	Patent
Sprache:	eng ; kor
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
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