Substrate treatment apparatus and substrate treatment method
A substrate processing apparatus of the present disclosure includes: a table on which a semiconductor element is seated; and a heating unit which is spaced apart from the table, and generates heat. The substrate processing apparatus can improve the reliability of removing moisture remaining in the s...
Gespeichert in:
| Hauptverfasser: | , , , |
|---|---|
| Format: | Patent |
| Sprache: | eng ; kor |
| Schlagworte: | |
| Online-Zugang: | Volltext bestellen |
| Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
| Zusammenfassung: | A substrate processing apparatus of the present disclosure includes: a table on which a semiconductor element is seated; and a heating unit which is spaced apart from the table, and generates heat. The substrate processing apparatus can improve the reliability of removing moisture remaining in the semiconductor element.
본 기재의 기판 처리 장치는 반도체 소자가 안착되는 테이블 및 상기 테이블로부터 이격되게 위치되고, 열을 발생시키는 가열 유닛을 포함한다. |
|---|