MANUFACTURING METHOD OF ULTRASOUND TRANSDUCER APPARATUS
According to the invention, disclosed is a method of manufacturing an ultrasound transducer apparatus, comprising the steps of: providing a substrate; etching the upper surface of the substrate; forming a pMUT element on an upper surface of the etched substrate; depositing an insulating material on...
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| Hauptverfasser: | , , , |
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| Format: | Patent |
| Sprache: | eng ; kor |
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| Zusammenfassung: | According to the invention, disclosed is a method of manufacturing an ultrasound transducer apparatus, comprising the steps of: providing a substrate; etching the upper surface of the substrate; forming a pMUT element on an upper surface of the etched substrate; depositing an insulating material on the pMUT element; and etching the rear surface of the substrate. Therefore, ultrasonic stimulation is applied to an object to be stimulated and is received through the ultrasound transducer apparatus.
본 발명에 따르면, 기판이 제공되는 단계; 상기 기판의 상면이 식각되는 단계; 식각된 상기 기판의 상면에 pMUT 요소가 형성되는 단계; 상기 pMUT 요소 상에 절연 물질이 증착되는 단계; 및 상기 기판의 후면이 식각되는 단계;를 포함하는, 초음파 트랜스듀서 장치의 제조 방법를 제공한다. |
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