photosensitive composition and pattern comprising the cured product thereof

The present invention relates to a photoactive compound with improved sensitivity and, more specifically, to a photoactive compound comprising: 1 to 50 parts by weight of a photoactive compound (PAC) or a photoacid generator (PAG); and 1 to 50 parts by weight of a curing agent with respect to 100 pa...

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Bibliographische Detailangaben
1. Verfasser:	HWANG SEUNGYEON
Format:	Patent
Sprache:	eng ; kor
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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Beschreibung
Zusammenfassung:	The present invention relates to a photoactive compound with improved sensitivity and, more specifically, to a photoactive compound comprising: 1 to 50 parts by weight of a photoactive compound (PAC) or a photoacid generator (PAG); and 1 to 50 parts by weight of a curing agent with respect to 100 parts by weight of a polyamide-imide compound comprising a repeating unit represented by chemical formula 1 and a repeating unit represented by chemical formula 2. 본 발명은 (1) 화학식 1로 표시되는 반복 단위 및 화학식 2로 표시되는 반복 단위를 포함하는 폴리아미드-이미드 화합물 100 중량부에 대하여 (2) 광활성 화합물(photoactive compound, PAC) 또는 광산발생제(photoacid generator, PAG) 1 내지 50 중량부; 및 (3) 경화제 1 내지 50 중량부를 포함하는 것을 특징으로 하는 감광성 조성물을 제공한다.