마이크로리소그래피용 광학 시스템
본 발명은 마이크로리소그래피용 광학 시스템에 관한 것으로서, 광학 시스템은 사용된 빔 경로를 따라 광학 시스템을 통과하는 전자기 방사선으로 작동하도록 설계되고, 사용된 빔 경로 외부에 위치된 영역을 갖는 적어도 하나의 구성요소(105)를 갖고, 상기 영역은 촉매 또는 화학적 활성층(110)을 갖고, 촉매 또는 화학적 활성층(110) 및/또는 상기 층(110)을 지지하는 캐리어(230, 240)는 다공성이다. A microlithographic optical system, wherein the optical system is desi...
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| creator | GROSSMANN JAN |
| description | 본 발명은 마이크로리소그래피용 광학 시스템에 관한 것으로서, 광학 시스템은 사용된 빔 경로를 따라 광학 시스템을 통과하는 전자기 방사선으로 작동하도록 설계되고, 사용된 빔 경로 외부에 위치된 영역을 갖는 적어도 하나의 구성요소(105)를 갖고, 상기 영역은 촉매 또는 화학적 활성층(110)을 갖고, 촉매 또는 화학적 활성층(110) 및/또는 상기 층(110)을 지지하는 캐리어(230, 240)는 다공성이다.
A microlithographic optical system, wherein the optical system is designed for operation with electromagnetic radiation that passes through the optical system along a used beam path, and includes at least one component (105) having a region outside the used beam path, wherein this region has a catalytic or chemically active layer (110), and wherein the catalytic or chemically active layer (110) and/or a carrier (230, 240) bearing this layer (110) is porous. |
| format | Patent |
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A microlithographic optical system, wherein the optical system is designed for operation with electromagnetic radiation that passes through the optical system along a used beam path, and includes at least one component (105) having a region outside the used beam path, wherein this region has a catalytic or chemically active layer (110), and wherein the catalytic or chemically active layer (110) and/or a carrier (230, 240) bearing this layer (110) is porous.</description><language>kor</language><subject>APPARATUS SPECIALLY ADAPTED THEREFOR ; CINEMATOGRAPHY ; ELECTROGRAPHY ; HOLOGRAPHY ; MATERIALS THEREFOR ; OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS ; OPTICS ; ORIGINALS THEREFOR ; PHOTOGRAPHY ; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES ; PHYSICS</subject><creationdate>2020</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20200219&DB=EPODOC&CC=KR&NR=20200018691A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25563,76318</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20200219&DB=EPODOC&CC=KR&NR=20200018691A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>GROSSMANN JAN</creatorcontrib><title>마이크로리소그래피용 광학 시스템</title><description>본 발명은 마이크로리소그래피용 광학 시스템에 관한 것으로서, 광학 시스템은 사용된 빔 경로를 따라 광학 시스템을 통과하는 전자기 방사선으로 작동하도록 설계되고, 사용된 빔 경로 외부에 위치된 영역을 갖는 적어도 하나의 구성요소(105)를 갖고, 상기 영역은 촉매 또는 화학적 활성층(110)을 갖고, 촉매 또는 화학적 활성층(110) 및/또는 상기 층(110)을 지지하는 캐리어(230, 240)는 다공성이다.
A microlithographic optical system, wherein the optical system is designed for operation with electromagnetic radiation that passes through the optical system along a used beam path, and includes at least one component (105) having a region outside the used beam path, wherein this region has a catalytic or chemically active layer (110), and wherein the catalytic or chemically active layer (110) and/or a carrier (230, 240) bearing this layer (110) is porous.</description><subject>APPARATUS SPECIALLY ADAPTED THEREFOR</subject><subject>CINEMATOGRAPHY</subject><subject>ELECTROGRAPHY</subject><subject>HOLOGRAPHY</subject><subject>MATERIALS THEREFOR</subject><subject>OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS</subject><subject>OPTICS</subject><subject>ORIGINALS THEREFOR</subject><subject>PHOTOGRAPHY</subject><subject>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</subject><subject>PHYSICS</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2020</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZNB_vbzjzdwtbxvXvF445_WyNW_ael5t3_F63oy3U_a8mbVS4dWWiW-nzlR40z3nTdeSt61zeBhY0xJzilN5oTQ3g7Kba4izh25qQX58anFBYnJqXmpJvHeQkYGRgYGBoYWZpaGjMXGqAJLEOms</recordid><startdate>20200219</startdate><enddate>20200219</enddate><creator>GROSSMANN JAN</creator><scope>EVB</scope></search><sort><creationdate>20200219</creationdate><title>마이크로리소그래피용 광학 시스템</title><author>GROSSMANN JAN</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_KR20200018691A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>kor</language><creationdate>2020</creationdate><topic>APPARATUS SPECIALLY ADAPTED THEREFOR</topic><topic>CINEMATOGRAPHY</topic><topic>ELECTROGRAPHY</topic><topic>HOLOGRAPHY</topic><topic>MATERIALS THEREFOR</topic><topic>OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS</topic><topic>OPTICS</topic><topic>ORIGINALS THEREFOR</topic><topic>PHOTOGRAPHY</topic><topic>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</topic><topic>PHYSICS</topic><toplevel>online_resources</toplevel><creatorcontrib>GROSSMANN JAN</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>GROSSMANN JAN</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>마이크로리소그래피용 광학 시스템</title><date>2020-02-19</date><risdate>2020</risdate><abstract>본 발명은 마이크로리소그래피용 광학 시스템에 관한 것으로서, 광학 시스템은 사용된 빔 경로를 따라 광학 시스템을 통과하는 전자기 방사선으로 작동하도록 설계되고, 사용된 빔 경로 외부에 위치된 영역을 갖는 적어도 하나의 구성요소(105)를 갖고, 상기 영역은 촉매 또는 화학적 활성층(110)을 갖고, 촉매 또는 화학적 활성층(110) 및/또는 상기 층(110)을 지지하는 캐리어(230, 240)는 다공성이다.
A microlithographic optical system, wherein the optical system is designed for operation with electromagnetic radiation that passes through the optical system along a used beam path, and includes at least one component (105) having a region outside the used beam path, wherein this region has a catalytic or chemically active layer (110), and wherein the catalytic or chemically active layer (110) and/or a carrier (230, 240) bearing this layer (110) is porous.</abstract><oa>free_for_read</oa></addata></record> |
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| subjects | APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS OPTICS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS |
| title | 마이크로리소그래피용 광학 시스템 |
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