POLYMER ORGANIC LAYER COMPOSITION AND METHOD OF FORMING PATTERNS

The present invention relates to: a polymer comprising a reaction product of a first compound represented by formula (1) and a second compound represented by formula (2); an organic layer composition comprising the polymer; and a pattern forming method using the organic layer composition. Formula (1...

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Bibliographische Detailangaben
Hauptverfasser:	JUNG, HYEON IL, KIM, SUNG HWAN, PARK, YU SHIN
Format:	Patent
Sprache:	eng ; kor
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CHEMISTRY CINEMATOGRAPHY COMPOSITIONS BASED THEREON ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONSONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS MATERIALS THEREFOR METALLURGY ORGANIC MACROMOLECULAR COMPOUNDS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES THEIR PREPARATION OR CHEMICAL WORKING-UP
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Beschreibung
Zusammenfassung:	The present invention relates to: a polymer comprising a reaction product of a first compound represented by formula (1) and a second compound represented by formula (2); an organic layer composition comprising the polymer; and a pattern forming method using the organic layer composition. Formula (1): (CHO)_n1-Ar^1-X-Ar^2-(CHO)_n2. Formula (2): Ar^3-(OH)_m. The definitions of formula 1 and 2 are as described in the specification. 화학식 1로 표현되는 제1 화합물과 화학식 2로 표현되는 제2 화합물의 반응 생성물을 포함하는 중합체, 상기 중합체를 포함하는 유기막 조성물, 및 상기 유기막 조성물을 사용하는 패턴 형성 방법에 관한 것이다. [화학식 1] (CHO)-Ar-X-Ar-(CHO)[화학식 2] Ar-(OH)상기 화학식 1 및 2의 정의는 명세서에 기재한 바와 같다.