감광성 수지 조성물, 수지막 및 전자 장치
특정 구조의 실레인 화합물(2급 아민 구조와, 분자의 2개의 말단에 특정의 규소 함유 구조를 구비함)과, 알칼리 가용성 수지와, 감광제를 포함하는 감광성 수지 조성물. 또, 이 감광성 수지 조성물을 경화시켜 이루어지는 수지막. 또, 이 수지막을 구비하는 전자 장치. 알칼리 가용성 수지로서 바람직하게는 폴리아마이드 수지이다. 감광제로서 바람직하게는 다이아조퀴논 화합물이다. Provided is a photosensitive resin composition comprising: a silane compound (provided with...
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| creator | KAWANAMI TAKUJI IKEDA TAKUJI |
| description | 특정 구조의 실레인 화합물(2급 아민 구조와, 분자의 2개의 말단에 특정의 규소 함유 구조를 구비함)과, 알칼리 가용성 수지와, 감광제를 포함하는 감광성 수지 조성물. 또, 이 감광성 수지 조성물을 경화시켜 이루어지는 수지막. 또, 이 수지막을 구비하는 전자 장치. 알칼리 가용성 수지로서 바람직하게는 폴리아마이드 수지이다. 감광제로서 바람직하게는 다이아조퀴논 화합물이다.
Provided is a photosensitive resin composition comprising: a silane compound (provided with a secondary amine structure, and a specific silicon-containing structure at two ends of the molecule) having a specific structure; an alkali-soluble resin; and a photosensitizer. Also, provided is a resin film obtained by curing said photosensitive resin composition. Also, provided is an electronic device provided with said resin film. The alkali-soluble resin is preferably a polyamide resin. The photosensitizer is preferably a diazoquinone compound. |
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Provided is a photosensitive resin composition comprising: a silane compound (provided with a secondary amine structure, and a specific silicon-containing structure at two ends of the molecule) having a specific structure; an alkali-soluble resin; and a photosensitizer. Also, provided is a resin film obtained by curing said photosensitive resin composition. Also, provided is an electronic device provided with said resin film. The alkali-soluble resin is preferably a polyamide resin. The photosensitizer is preferably a diazoquinone compound.</description><language>kor</language><subject>APPARATUS SPECIALLY ADAPTED THEREFOR ; CHEMISTRY ; CINEMATOGRAPHY ; COMPOSITIONS BASED THEREON ; ELECTROGRAPHY ; HOLOGRAPHY ; MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONSONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS ; MATERIALS THEREFOR ; METALLURGY ; ORGANIC MACROMOLECULAR COMPOUNDS ; ORIGINALS THEREFOR ; PHOTOGRAPHY ; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES ; PHYSICS ; THEIR PREPARATION OR CHEMICAL WORKING-UP</subject><creationdate>2020</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20200129&DB=EPODOC&CC=KR&NR=20200009124A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25564,76419</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20200129&DB=EPODOC&CC=KR&NR=20200009124A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>KAWANAMI TAKUJI</creatorcontrib><creatorcontrib>IKEDA TAKUJI</creatorcontrib><title>감광성 수지 조성물, 수지막 및 전자 장치</title><description>특정 구조의 실레인 화합물(2급 아민 구조와, 분자의 2개의 말단에 특정의 규소 함유 구조를 구비함)과, 알칼리 가용성 수지와, 감광제를 포함하는 감광성 수지 조성물. 또, 이 감광성 수지 조성물을 경화시켜 이루어지는 수지막. 또, 이 수지막을 구비하는 전자 장치. 알칼리 가용성 수지로서 바람직하게는 폴리아마이드 수지이다. 감광제로서 바람직하게는 다이아조퀴논 화합물이다.
Provided is a photosensitive resin composition comprising: a silane compound (provided with a secondary amine structure, and a specific silicon-containing structure at two ends of the molecule) having a specific structure; an alkali-soluble resin; and a photosensitizer. Also, provided is a resin film obtained by curing said photosensitive resin composition. Also, provided is an electronic device provided with said resin film. The alkali-soluble resin is preferably a polyamide resin. The photosensitizer is preferably a diazoquinone compound.</description><subject>APPARATUS SPECIALLY ADAPTED THEREFOR</subject><subject>CHEMISTRY</subject><subject>CINEMATOGRAPHY</subject><subject>COMPOSITIONS BASED THEREON</subject><subject>ELECTROGRAPHY</subject><subject>HOLOGRAPHY</subject><subject>MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONSONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS</subject><subject>MATERIALS THEREFOR</subject><subject>METALLURGY</subject><subject>ORGANIC MACROMOLECULAR COMPOUNDS</subject><subject>ORIGINALS THEREFOR</subject><subject>PHOTOGRAPHY</subject><subject>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</subject><subject>PHYSICS</subject><subject>THEIR PREPARATION OR CHEMICAL WORKING-UP</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2020</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZDB_tWHCqy0T37RsVHjTMePN8gaFNws3AHmv1-zRgYq8Xt6p8HpDv8KbBS1v5k1QeDNv6ZudM3gYWNMSc4pTeaE0N4Oym2uIs4duakF-fGpxQWJyal5qSbx3kJGBkQEQWBoamTgaE6cKAFScPRI</recordid><startdate>20200129</startdate><enddate>20200129</enddate><creator>KAWANAMI TAKUJI</creator><creator>IKEDA TAKUJI</creator><scope>EVB</scope></search><sort><creationdate>20200129</creationdate><title>감광성 수지 조성물, 수지막 및 전자 장치</title><author>KAWANAMI TAKUJI ; IKEDA TAKUJI</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_KR20200009124A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>kor</language><creationdate>2020</creationdate><topic>APPARATUS SPECIALLY ADAPTED THEREFOR</topic><topic>CHEMISTRY</topic><topic>CINEMATOGRAPHY</topic><topic>COMPOSITIONS BASED THEREON</topic><topic>ELECTROGRAPHY</topic><topic>HOLOGRAPHY</topic><topic>MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONSONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS</topic><topic>MATERIALS THEREFOR</topic><topic>METALLURGY</topic><topic>ORGANIC MACROMOLECULAR COMPOUNDS</topic><topic>ORIGINALS THEREFOR</topic><topic>PHOTOGRAPHY</topic><topic>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</topic><topic>PHYSICS</topic><topic>THEIR PREPARATION OR CHEMICAL WORKING-UP</topic><toplevel>online_resources</toplevel><creatorcontrib>KAWANAMI TAKUJI</creatorcontrib><creatorcontrib>IKEDA TAKUJI</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>KAWANAMI TAKUJI</au><au>IKEDA TAKUJI</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>감광성 수지 조성물, 수지막 및 전자 장치</title><date>2020-01-29</date><risdate>2020</risdate><abstract>특정 구조의 실레인 화합물(2급 아민 구조와, 분자의 2개의 말단에 특정의 규소 함유 구조를 구비함)과, 알칼리 가용성 수지와, 감광제를 포함하는 감광성 수지 조성물. 또, 이 감광성 수지 조성물을 경화시켜 이루어지는 수지막. 또, 이 수지막을 구비하는 전자 장치. 알칼리 가용성 수지로서 바람직하게는 폴리아마이드 수지이다. 감광제로서 바람직하게는 다이아조퀴논 화합물이다.
Provided is a photosensitive resin composition comprising: a silane compound (provided with a secondary amine structure, and a specific silicon-containing structure at two ends of the molecule) having a specific structure; an alkali-soluble resin; and a photosensitizer. Also, provided is a resin film obtained by curing said photosensitive resin composition. Also, provided is an electronic device provided with said resin film. The alkali-soluble resin is preferably a polyamide resin. The photosensitizer is preferably a diazoquinone compound.</abstract><oa>free_for_read</oa></addata></record> |
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| subjects | APPARATUS SPECIALLY ADAPTED THEREFOR CHEMISTRY CINEMATOGRAPHY COMPOSITIONS BASED THEREON ELECTROGRAPHY HOLOGRAPHY MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONSONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS MATERIALS THEREFOR METALLURGY ORGANIC MACROMOLECULAR COMPOUNDS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS THEIR PREPARATION OR CHEMICAL WORKING-UP |
| title | 감광성 수지 조성물, 수지막 및 전자 장치 |
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