4 - STRIPPING COMPOSITIONS FOR PHOTORESIST COMPRISING QUATERNARY AMMONIUM-CYCLODEXTRIN OR ITS DERIVATIVES

The present invention provides a photoresist stripping liquid composition comprising quaternary ammonium-cyclodextrin or a derivative thereof. According to the present invention, it is possible to provide the stripping liquid composition excellent in stripping performance for photoresist and corrosi...

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Bibliographische Detailangaben
Hauptverfasser:	JEONG, BYOUNG HYUN, KANG, JOO WON, LEE, DAE WON, YOO, CHUNG YOUL, HEO, SUN HEE, KIM, BOO KYUNG, JO, YONG JEONG, SON, IN YOUNG, KIM, JUN HWAN, HYEONG, DO SEONG, AHN, SANG YEOB, LEE, SEUL KI
Format:	Patent
Sprache:	eng ; kor
Schlagworte:	ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES APPARATUS SPECIALLY ADAPTED THEREFOR CANDLES CHEMISTRY CINEMATOGRAPHY DETERGENT COMPOSITIONS DETERGENTS ELECTROGRAPHY FATTY ACIDS THEREFROM HOLOGRAPHY MATERIALS THEREFOR METALLURGY ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS RECOVERY OF GLYCEROL RESIN SOAPS SOAP OR SOAP-MAKING USE OF SINGLE SUBSTANCES AS DETERGENTS
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