4 - STRIPPING COMPOSITIONS FOR PHOTORESIST COMPRISING QUATERNARY AMMONIUM-CYCLODEXTRIN OR ITS DERIVATIVES

The present invention provides a photoresist stripping liquid composition comprising quaternary ammonium-cyclodextrin or a derivative thereof. According to the present invention, it is possible to provide the stripping liquid composition excellent in stripping performance for photoresist and corrosi...

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Bibliographische Detailangaben
Hauptverfasser:	JEONG, BYOUNG HYUN, KANG, JOO WON, LEE, DAE WON, YOO, CHUNG YOUL, HEO, SUN HEE, KIM, BOO KYUNG, JO, YONG JEONG, SON, IN YOUNG, KIM, JUN HWAN, HYEONG, DO SEONG, AHN, SANG YEOB, LEE, SEUL KI
Format:	Patent
Sprache:	eng ; kor
Schlagworte:	ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES APPARATUS SPECIALLY ADAPTED THEREFOR CANDLES CHEMISTRY CINEMATOGRAPHY DETERGENT COMPOSITIONS DETERGENTS ELECTROGRAPHY FATTY ACIDS THEREFROM HOLOGRAPHY MATERIALS THEREFOR METALLURGY ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS RECOVERY OF GLYCEROL RESIN SOAPS SOAP OR SOAP-MAKING USE OF SINGLE SUBSTANCES AS DETERGENTS
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Beschreibung
Zusammenfassung:	The present invention provides a photoresist stripping liquid composition comprising quaternary ammonium-cyclodextrin or a derivative thereof. According to the present invention, it is possible to provide the stripping liquid composition excellent in stripping performance for photoresist and corrosion resistance for metal wiring and provide the environmentally friendly stripping liquid less harmful to the human body and the environment. 본 발명은 4차 암모늄-시클로덱스트린 또는 그 유도체를 포함하는 포토레지스트 박리액 조성물을 제공한다. 이러한 본 발명에 따르면, 포토레지스트에 대한 박리성능 및 금속배선에 대한 내부식성이 우수한 박리액 조성물을 제공할 수 있을 뿐만 아니라, 인체 및 환경에 대한 유해성이 적은 친환경적인 박리액을 제공할 수 있다.