4 - STRIPPING COMPOSITIONS FOR PHOTORESIST COMPRISING QUATERNARY AMMONIUM-CYCLODEXTRIN OR ITS DERIVATIVES
The present invention provides a photoresist stripping liquid composition comprising quaternary ammonium-cyclodextrin or a derivative thereof. According to the present invention, it is possible to provide the stripping liquid composition excellent in stripping performance for photoresist and corrosi...
Gespeichert in:
| Hauptverfasser: | , , , , , , , , , , , |
|---|---|
| Format: | Patent |
| Sprache: | eng ; kor |
| Schlagworte: | |
| Online-Zugang: | Volltext bestellen |
| Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
| container_end_page | |
|---|---|
| container_issue | |
| container_start_page | |
| container_title | |
| container_volume | |
| creator | JEONG, BYOUNG HYUN KANG, JOO WON LEE, DAE WON YOO, CHUNG YOUL HEO, SUN HEE KIM, BOO KYUNG JO, YONG JEONG SON, IN YOUNG KIM, JUN HWAN HYEONG, DO SEONG AHN, SANG YEOB LEE, SEUL KI |
| description | The present invention provides a photoresist stripping liquid composition comprising quaternary ammonium-cyclodextrin or a derivative thereof. According to the present invention, it is possible to provide the stripping liquid composition excellent in stripping performance for photoresist and corrosion resistance for metal wiring and provide the environmentally friendly stripping liquid less harmful to the human body and the environment.
본 발명은 4차 암모늄-시클로덱스트린 또는 그 유도체를 포함하는 포토레지스트 박리액 조성물을 제공한다. 이러한 본 발명에 따르면, 포토레지스트에 대한 박리성능 및 금속배선에 대한 내부식성이 우수한 박리액 조성물을 제공할 수 있을 뿐만 아니라, 인체 및 환경에 대한 유해성이 적은 친환경적인 박리액을 제공할 수 있다. |
| format | Patent |
| fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_KR20200008678A</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>KR20200008678A</sourcerecordid><originalsourceid>FETCH-epo_espacenet_KR20200008678A3</originalsourceid><addsrcrecordid>eNqNjLEKwkAQRNNYiPoPC9aBEEXTHpeLWfRu4-4lmCoEOUEQDej_YxQ_wGleMW9mGl3XEIN4xqpCtwNNtiJBj-QECmKoSvLERlD8t2SUj3eslTfsFLegrCWHtY11qw-Um9N45mCcohfIDWOjPDZG5tHk0t-eYfHjLFoWxusyDsOjC8-hP4d7eHV7TpM0GZNttpla_We9AZ2wN6c</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>4 - STRIPPING COMPOSITIONS FOR PHOTORESIST COMPRISING QUATERNARY AMMONIUM-CYCLODEXTRIN OR ITS DERIVATIVES</title><source>esp@cenet</source><creator>JEONG, BYOUNG HYUN ; KANG, JOO WON ; LEE, DAE WON ; YOO, CHUNG YOUL ; HEO, SUN HEE ; KIM, BOO KYUNG ; JO, YONG JEONG ; SON, IN YOUNG ; KIM, JUN HWAN ; HYEONG, DO SEONG ; AHN, SANG YEOB ; LEE, SEUL KI</creator><creatorcontrib>JEONG, BYOUNG HYUN ; KANG, JOO WON ; LEE, DAE WON ; YOO, CHUNG YOUL ; HEO, SUN HEE ; KIM, BOO KYUNG ; JO, YONG JEONG ; SON, IN YOUNG ; KIM, JUN HWAN ; HYEONG, DO SEONG ; AHN, SANG YEOB ; LEE, SEUL KI</creatorcontrib><description>The present invention provides a photoresist stripping liquid composition comprising quaternary ammonium-cyclodextrin or a derivative thereof. According to the present invention, it is possible to provide the stripping liquid composition excellent in stripping performance for photoresist and corrosion resistance for metal wiring and provide the environmentally friendly stripping liquid less harmful to the human body and the environment.
본 발명은 4차 암모늄-시클로덱스트린 또는 그 유도체를 포함하는 포토레지스트 박리액 조성물을 제공한다. 이러한 본 발명에 따르면, 포토레지스트에 대한 박리성능 및 금속배선에 대한 내부식성이 우수한 박리액 조성물을 제공할 수 있을 뿐만 아니라, 인체 및 환경에 대한 유해성이 적은 친환경적인 박리액을 제공할 수 있다.</description><language>eng ; kor</language><subject>ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES ; APPARATUS SPECIALLY ADAPTED THEREFOR ; CANDLES ; CHEMISTRY ; CINEMATOGRAPHY ; DETERGENT COMPOSITIONS ; DETERGENTS ; ELECTROGRAPHY ; FATTY ACIDS THEREFROM ; HOLOGRAPHY ; MATERIALS THEREFOR ; METALLURGY ; ORIGINALS THEREFOR ; PHOTOGRAPHY ; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES ; PHYSICS ; RECOVERY OF GLYCEROL ; RESIN SOAPS ; SOAP OR SOAP-MAKING ; USE OF SINGLE SUBSTANCES AS DETERGENTS</subject><creationdate>2020</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20200129&DB=EPODOC&CC=KR&NR=20200008678A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25563,76318</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20200129&DB=EPODOC&CC=KR&NR=20200008678A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>JEONG, BYOUNG HYUN</creatorcontrib><creatorcontrib>KANG, JOO WON</creatorcontrib><creatorcontrib>LEE, DAE WON</creatorcontrib><creatorcontrib>YOO, CHUNG YOUL</creatorcontrib><creatorcontrib>HEO, SUN HEE</creatorcontrib><creatorcontrib>KIM, BOO KYUNG</creatorcontrib><creatorcontrib>JO, YONG JEONG</creatorcontrib><creatorcontrib>SON, IN YOUNG</creatorcontrib><creatorcontrib>KIM, JUN HWAN</creatorcontrib><creatorcontrib>HYEONG, DO SEONG</creatorcontrib><creatorcontrib>AHN, SANG YEOB</creatorcontrib><creatorcontrib>LEE, SEUL KI</creatorcontrib><title>4 - STRIPPING COMPOSITIONS FOR PHOTORESIST COMPRISING QUATERNARY AMMONIUM-CYCLODEXTRIN OR ITS DERIVATIVES</title><description>The present invention provides a photoresist stripping liquid composition comprising quaternary ammonium-cyclodextrin or a derivative thereof. According to the present invention, it is possible to provide the stripping liquid composition excellent in stripping performance for photoresist and corrosion resistance for metal wiring and provide the environmentally friendly stripping liquid less harmful to the human body and the environment.
본 발명은 4차 암모늄-시클로덱스트린 또는 그 유도체를 포함하는 포토레지스트 박리액 조성물을 제공한다. 이러한 본 발명에 따르면, 포토레지스트에 대한 박리성능 및 금속배선에 대한 내부식성이 우수한 박리액 조성물을 제공할 수 있을 뿐만 아니라, 인체 및 환경에 대한 유해성이 적은 친환경적인 박리액을 제공할 수 있다.</description><subject>ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES</subject><subject>APPARATUS SPECIALLY ADAPTED THEREFOR</subject><subject>CANDLES</subject><subject>CHEMISTRY</subject><subject>CINEMATOGRAPHY</subject><subject>DETERGENT COMPOSITIONS</subject><subject>DETERGENTS</subject><subject>ELECTROGRAPHY</subject><subject>FATTY ACIDS THEREFROM</subject><subject>HOLOGRAPHY</subject><subject>MATERIALS THEREFOR</subject><subject>METALLURGY</subject><subject>ORIGINALS THEREFOR</subject><subject>PHOTOGRAPHY</subject><subject>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</subject><subject>PHYSICS</subject><subject>RECOVERY OF GLYCEROL</subject><subject>RESIN SOAPS</subject><subject>SOAP OR SOAP-MAKING</subject><subject>USE OF SINGLE SUBSTANCES AS DETERGENTS</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2020</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNqNjLEKwkAQRNNYiPoPC9aBEEXTHpeLWfRu4-4lmCoEOUEQDej_YxQ_wGleMW9mGl3XEIN4xqpCtwNNtiJBj-QECmKoSvLERlD8t2SUj3eslTfsFLegrCWHtY11qw-Um9N45mCcohfIDWOjPDZG5tHk0t-eYfHjLFoWxusyDsOjC8-hP4d7eHV7TpM0GZNttpla_We9AZ2wN6c</recordid><startdate>20200129</startdate><enddate>20200129</enddate><creator>JEONG, BYOUNG HYUN</creator><creator>KANG, JOO WON</creator><creator>LEE, DAE WON</creator><creator>YOO, CHUNG YOUL</creator><creator>HEO, SUN HEE</creator><creator>KIM, BOO KYUNG</creator><creator>JO, YONG JEONG</creator><creator>SON, IN YOUNG</creator><creator>KIM, JUN HWAN</creator><creator>HYEONG, DO SEONG</creator><creator>AHN, SANG YEOB</creator><creator>LEE, SEUL KI</creator><scope>EVB</scope></search><sort><creationdate>20200129</creationdate><title>4 - STRIPPING COMPOSITIONS FOR PHOTORESIST COMPRISING QUATERNARY AMMONIUM-CYCLODEXTRIN OR ITS DERIVATIVES</title><author>JEONG, BYOUNG HYUN ; KANG, JOO WON ; LEE, DAE WON ; YOO, CHUNG YOUL ; HEO, SUN HEE ; KIM, BOO KYUNG ; JO, YONG JEONG ; SON, IN YOUNG ; KIM, JUN HWAN ; HYEONG, DO SEONG ; AHN, SANG YEOB ; LEE, SEUL KI</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_KR20200008678A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng ; kor</language><creationdate>2020</creationdate><topic>ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES</topic><topic>APPARATUS SPECIALLY ADAPTED THEREFOR</topic><topic>CANDLES</topic><topic>CHEMISTRY</topic><topic>CINEMATOGRAPHY</topic><topic>DETERGENT COMPOSITIONS</topic><topic>DETERGENTS</topic><topic>ELECTROGRAPHY</topic><topic>FATTY ACIDS THEREFROM</topic><topic>HOLOGRAPHY</topic><topic>MATERIALS THEREFOR</topic><topic>METALLURGY</topic><topic>ORIGINALS THEREFOR</topic><topic>PHOTOGRAPHY</topic><topic>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</topic><topic>PHYSICS</topic><topic>RECOVERY OF GLYCEROL</topic><topic>RESIN SOAPS</topic><topic>SOAP OR SOAP-MAKING</topic><topic>USE OF SINGLE SUBSTANCES AS DETERGENTS</topic><toplevel>online_resources</toplevel><creatorcontrib>JEONG, BYOUNG HYUN</creatorcontrib><creatorcontrib>KANG, JOO WON</creatorcontrib><creatorcontrib>LEE, DAE WON</creatorcontrib><creatorcontrib>YOO, CHUNG YOUL</creatorcontrib><creatorcontrib>HEO, SUN HEE</creatorcontrib><creatorcontrib>KIM, BOO KYUNG</creatorcontrib><creatorcontrib>JO, YONG JEONG</creatorcontrib><creatorcontrib>SON, IN YOUNG</creatorcontrib><creatorcontrib>KIM, JUN HWAN</creatorcontrib><creatorcontrib>HYEONG, DO SEONG</creatorcontrib><creatorcontrib>AHN, SANG YEOB</creatorcontrib><creatorcontrib>LEE, SEUL KI</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>JEONG, BYOUNG HYUN</au><au>KANG, JOO WON</au><au>LEE, DAE WON</au><au>YOO, CHUNG YOUL</au><au>HEO, SUN HEE</au><au>KIM, BOO KYUNG</au><au>JO, YONG JEONG</au><au>SON, IN YOUNG</au><au>KIM, JUN HWAN</au><au>HYEONG, DO SEONG</au><au>AHN, SANG YEOB</au><au>LEE, SEUL KI</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>4 - STRIPPING COMPOSITIONS FOR PHOTORESIST COMPRISING QUATERNARY AMMONIUM-CYCLODEXTRIN OR ITS DERIVATIVES</title><date>2020-01-29</date><risdate>2020</risdate><abstract>The present invention provides a photoresist stripping liquid composition comprising quaternary ammonium-cyclodextrin or a derivative thereof. According to the present invention, it is possible to provide the stripping liquid composition excellent in stripping performance for photoresist and corrosion resistance for metal wiring and provide the environmentally friendly stripping liquid less harmful to the human body and the environment.
본 발명은 4차 암모늄-시클로덱스트린 또는 그 유도체를 포함하는 포토레지스트 박리액 조성물을 제공한다. 이러한 본 발명에 따르면, 포토레지스트에 대한 박리성능 및 금속배선에 대한 내부식성이 우수한 박리액 조성물을 제공할 수 있을 뿐만 아니라, 인체 및 환경에 대한 유해성이 적은 친환경적인 박리액을 제공할 수 있다.</abstract><oa>free_for_read</oa></addata></record> |
| fulltext | fulltext_linktorsrc |
| identifier | |
| ispartof | |
| issn | |
| language | eng ; kor |
| recordid | cdi_epo_espacenet_KR20200008678A |
| source | esp@cenet |
| subjects | ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES APPARATUS SPECIALLY ADAPTED THEREFOR CANDLES CHEMISTRY CINEMATOGRAPHY DETERGENT COMPOSITIONS DETERGENTS ELECTROGRAPHY FATTY ACIDS THEREFROM HOLOGRAPHY MATERIALS THEREFOR METALLURGY ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS RECOVERY OF GLYCEROL RESIN SOAPS SOAP OR SOAP-MAKING USE OF SINGLE SUBSTANCES AS DETERGENTS |
| title | 4 - STRIPPING COMPOSITIONS FOR PHOTORESIST COMPRISING QUATERNARY AMMONIUM-CYCLODEXTRIN OR ITS DERIVATIVES |
| url | https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-11T18%3A31%3A39IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=JEONG,%20BYOUNG%20HYUN&rft.date=2020-01-29&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3EKR20200008678A%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true |