POLYMER ORGANIC LAYER COMPOSITION AND METHOD OF FORMING PATTERNS

The present invention relates to a polymer comprising a moiety represented by formula (1) in a structural unit, an organic layer composition comprising the polymer, and a pattern forming method using the organic layer composition. Each substituent definition of formula (1) is as described in the spe...

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Bibliographische Detailangaben
Hauptverfasser:	KIM, YOO NA, HEO, YU MI, JEONG, SEUL GI, KWON, HYO YOUNG, KIM, HEA JUNG, SHIN, SEUNG WOOK, YANG, SUN YOUNG, YUN, HUI CHAN, LIM, SANG HAK, WON, DONG HOON
Format:	Patent
Sprache:	eng ; kor
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CHEMISTRY CINEMATOGRAPHY COMPOSITIONS BASED THEREON ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONSONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS MATERIALS THEREFOR METALLURGY ORGANIC MACROMOLECULAR COMPOUNDS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES THEIR PREPARATION OR CHEMICAL WORKING-UP
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Beschreibung
Zusammenfassung:	The present invention relates to a polymer comprising a moiety represented by formula (1) in a structural unit, an organic layer composition comprising the polymer, and a pattern forming method using the organic layer composition. Each substituent definition of formula (1) is as described in the specification. 구조 단위 내에 화학식 1로 표현되는 부분을 포함하는 중합체, 상기 중합체를 포함하는 유기막 조성물, 및 상기 유기막 조성물을 사용하는 패턴형성방법에 관한 것이다. [화학식 1]상기 화학식 1의 각 치환기 정의는 명세서 내에 기재한 바와 같다.