Electrostatic chuck unit and thin film depositing apparatus using the same
According to one embodiment of the present invention, disclosed is an electrostatic chuck unit, which has a first wiring part generating relatively weak electrostatic force and a second wiring part generating relatively strong electrostatic force on a main body. Compared to the first wiring part, th...
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Sprache: | eng ; kor |
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Zusammenfassung: | According to one embodiment of the present invention, disclosed is an electrostatic chuck unit, which has a first wiring part generating relatively weak electrostatic force and a second wiring part generating relatively strong electrostatic force on a main body. Compared to the first wiring part, the second wiring part has a denser interval between wiring.
본 발명의 일 실시예는 상대적으로 약한 정전력을 발생시키는 제1배선부와, 상대적으로 강한 정전력을 발생시키는 제2배선부를 본체에 구비한 정전척 유닛을 개시한다. |
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