NOZZLE FOR CLEANING SUBSTRATE AND METHOD OF MANUFACTURING THE SAME
The present invention relates to a nozzle for cleaning a substrate, which discharges cleaning liquid to a substrate, and a manufacturing method thereof, and more specifically, to a nozzle for cleaning a substrate, which provides a nozzle for cleaning a substrate having pressure-resistant property ca...
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| creator | KIM BEOM JIN KIM HYUN SIN |
| description | The present invention relates to a nozzle for cleaning a substrate, which discharges cleaning liquid to a substrate, and a manufacturing method thereof, and more specifically, to a nozzle for cleaning a substrate, which provides a nozzle for cleaning a substrate having pressure-resistant property capable of bearing even high supply pressure of cleaning liquid, and a manufacturing method thereof. The nozzle for cleaning a substrate includes: an upper flow path part communicating with a main hole; and a lower flow path part allowing a discharge hole to communicate with the upper flow path part.
본 발명은 기판에 세정액을 토출하는 기판 세정용 노즐 및 그 제조 방법에 관한 것으로서, 특히, 높은 세정액의 공급 압력에도 견딜 수 있는 내압 특성을 갖는 기판 세정용 노즐을 제공하는 기판 세정용 노즐 및 그 제조 방법에 관한 것이다. |
| format | Patent |
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본 발명은 기판에 세정액을 토출하는 기판 세정용 노즐 및 그 제조 방법에 관한 것으로서, 특히, 높은 세정액의 공급 압력에도 견딜 수 있는 내압 특성을 갖는 기판 세정용 노즐을 제공하는 기판 세정용 노즐 및 그 제조 방법에 관한 것이다.</description><language>eng ; kor</language><subject>BASIC ELECTRIC ELEMENTS ; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ; ELECTRICITY ; SEMICONDUCTOR DEVICES</subject><creationdate>2020</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20200103&DB=EPODOC&CC=KR&NR=20200000665A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25542,76289</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20200103&DB=EPODOC&CC=KR&NR=20200000665A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>KIM BEOM JIN</creatorcontrib><creatorcontrib>KIM HYUN SIN</creatorcontrib><title>NOZZLE FOR CLEANING SUBSTRATE AND METHOD OF MANUFACTURING THE SAME</title><description>The present invention relates to a nozzle for cleaning a substrate, which discharges cleaning liquid to a substrate, and a manufacturing method thereof, and more specifically, to a nozzle for cleaning a substrate, which provides a nozzle for cleaning a substrate having pressure-resistant property capable of bearing even high supply pressure of cleaning liquid, and a manufacturing method thereof. The nozzle for cleaning a substrate includes: an upper flow path part communicating with a main hole; and a lower flow path part allowing a discharge hole to communicate with the upper flow path part.
본 발명은 기판에 세정액을 토출하는 기판 세정용 노즐 및 그 제조 방법에 관한 것으로서, 특히, 높은 세정액의 공급 압력에도 견딜 수 있는 내압 특성을 갖는 기판 세정용 노즐을 제공하는 기판 세정용 노즐 및 그 제조 방법에 관한 것이다.</description><subject>BASIC ELECTRIC ELEMENTS</subject><subject>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</subject><subject>ELECTRICITY</subject><subject>SEMICONDUCTOR DEVICES</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2020</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZHDy84-K8nFVcPMPUnD2cXX08_RzVwgOdQoOCXIMcVVw9HNR8HUN8fB3UfB3U_B19At1c3QOCQ0CqQrxcFUIdvR15WFgTUvMKU7lhdLcDMpuriHOHrqpBfnxqcUFicmpeakl8d5BRgZGBiBgZmbqaEycKgCfpCva</recordid><startdate>20200103</startdate><enddate>20200103</enddate><creator>KIM BEOM JIN</creator><creator>KIM HYUN SIN</creator><scope>EVB</scope></search><sort><creationdate>20200103</creationdate><title>NOZZLE FOR CLEANING SUBSTRATE AND METHOD OF MANUFACTURING THE SAME</title><author>KIM BEOM JIN ; KIM HYUN SIN</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_KR20200000665A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng ; kor</language><creationdate>2020</creationdate><topic>BASIC ELECTRIC ELEMENTS</topic><topic>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</topic><topic>ELECTRICITY</topic><topic>SEMICONDUCTOR DEVICES</topic><toplevel>online_resources</toplevel><creatorcontrib>KIM BEOM JIN</creatorcontrib><creatorcontrib>KIM HYUN SIN</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>KIM BEOM JIN</au><au>KIM HYUN SIN</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>NOZZLE FOR CLEANING SUBSTRATE AND METHOD OF MANUFACTURING THE SAME</title><date>2020-01-03</date><risdate>2020</risdate><abstract>The present invention relates to a nozzle for cleaning a substrate, which discharges cleaning liquid to a substrate, and a manufacturing method thereof, and more specifically, to a nozzle for cleaning a substrate, which provides a nozzle for cleaning a substrate having pressure-resistant property capable of bearing even high supply pressure of cleaning liquid, and a manufacturing method thereof. The nozzle for cleaning a substrate includes: an upper flow path part communicating with a main hole; and a lower flow path part allowing a discharge hole to communicate with the upper flow path part.
본 발명은 기판에 세정액을 토출하는 기판 세정용 노즐 및 그 제조 방법에 관한 것으로서, 특히, 높은 세정액의 공급 압력에도 견딜 수 있는 내압 특성을 갖는 기판 세정용 노즐을 제공하는 기판 세정용 노즐 및 그 제조 방법에 관한 것이다.</abstract><oa>free_for_read</oa></addata></record> |
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| subjects | BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES |
| title | NOZZLE FOR CLEANING SUBSTRATE AND METHOD OF MANUFACTURING THE SAME |
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