NOZZLE FOR CLEANING SUBSTRATE AND METHOD OF MANUFACTURING THE SAME
The present invention relates to a nozzle for cleaning a substrate, which discharges cleaning liquid to a substrate, and a manufacturing method thereof, and more specifically, to a nozzle for cleaning a substrate, which provides a nozzle for cleaning a substrate having pressure-resistant property ca...
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| Hauptverfasser: | , |
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| Format: | Patent |
| Sprache: | eng ; kor |
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| Zusammenfassung: | The present invention relates to a nozzle for cleaning a substrate, which discharges cleaning liquid to a substrate, and a manufacturing method thereof, and more specifically, to a nozzle for cleaning a substrate, which provides a nozzle for cleaning a substrate having pressure-resistant property capable of bearing even high supply pressure of cleaning liquid, and a manufacturing method thereof. The nozzle for cleaning a substrate includes: an upper flow path part communicating with a main hole; and a lower flow path part allowing a discharge hole to communicate with the upper flow path part.
본 발명은 기판에 세정액을 토출하는 기판 세정용 노즐 및 그 제조 방법에 관한 것으로서, 특히, 높은 세정액의 공급 압력에도 견딜 수 있는 내압 특성을 갖는 기판 세정용 노즐을 제공하는 기판 세정용 노즐 및 그 제조 방법에 관한 것이다. |
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