PHOTOMASK FOR IMPRINTING AND METHOD FOR MANUFACTURING THEREOF

The present invention relates to an imprinting photo-mask, which comprises: a transparent substrate; a light blocking pattern provided on the transparent substrate; and a dry film resist (DFR) pattern provided on the light blocking pattern. According to an exemplary embodiment of the present inventi...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	BAE NAM SEOK, SON YONG GOO, LEE SEUNG HEON
Format:	Patent
Sprache:	eng ; kor
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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