PHOTOMASK FOR IMPRINTING AND METHOD FOR MANUFACTURING THEREOF

The present invention relates to an imprinting photo-mask, which comprises: a transparent substrate; a light blocking pattern provided on the transparent substrate; and a dry film resist (DFR) pattern provided on the light blocking pattern. According to an exemplary embodiment of the present inventi...

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Bibliographische Detailangaben
Hauptverfasser:	BAE NAM SEOK, SON YONG GOO, LEE SEUNG HEON
Format:	Patent
Sprache:	eng ; kor
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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Beschreibung
Zusammenfassung:	The present invention relates to an imprinting photo-mask, which comprises: a transparent substrate; a light blocking pattern provided on the transparent substrate; and a dry film resist (DFR) pattern provided on the light blocking pattern. According to an exemplary embodiment of the present invention, pinhole generation of a light blocking layer, damages to a mold pattern, and the like can be prevented. 본 출원의 일 실시상태에 따른 임프린팅용 포토마스크는, 투명 기판; 상기 투명 기판 상에 구비된 차광 패턴; 및 상기 차광 패턴 상에 구비된 드라이 필름 레지스트(Dry Film Resist, DFR) 패턴을 포함한다.