Method and Apparatus for treating substrate

According to an embodiment of the present invention, provided are a substrate treatment method and an apparatus thereof. The substrate treatment apparatus includes: a process chamber having an internal treatment space; a support unit supporting a substrate in the treatment space; and a gas supply un...

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Bibliographische Detailangaben

1. Verfasser:	MOON HYUNGCHUL
Format:	Patent
Sprache:	eng ; kor
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
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