Gas storage cylinder Deposition system and Method of manufacturing semiconductor device

A gas storage cylinder, a deposition system, and a method of manufacturing a semiconductor device are provided. According to the present invention, the method of manufacturing a semiconductor device includes the following processes: mounting a gas cylinder in which monochlorosilane is stored in a ga...

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Bibliographische Detailangaben
Hauptverfasser:	PARK KEUM SEOK, KONG BYUNG KOO, KIM MIJEONG, PARK PANKWI, HAN YEONOCK, CHO YOUNJOUNG, JANG CHANGEUN, LEE JIN WOOK, YOO JEONGHO, CHUNG WONWOONG
Format:	Patent
Sprache:	eng ; kor
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:	A gas storage cylinder, a deposition system, and a method of manufacturing a semiconductor device are provided. According to the present invention, the method of manufacturing a semiconductor device includes the following processes: mounting a gas cylinder in which monochlorosilane is stored in a gas supply unit; and supplying the monochlorosilane into a process chamber to form a silicon-containing film. The gas cylinder may contain manganese. An objective of the present invention is to provide a gas storage cylinder which can store source gas stably. 가스 저장 용기, 증착 시스템, 및 반도체 소자 제조 방법이 제공된다. 본 발명에 따르면, 반도체 소자 제조 방법은 모노클로로실란이 저장된 가스 용기를 가스 공급 유닛 내에 장착하는 것; 및 상기 모노클로로실란을 공정 챔버 내에 공급하여, 실리콘 함유막을 형성하는 것을 포함할 수 있다. 상기 가스 용기는 망간을 포함할 수 있다.