A RESIST STRIPPER COMPOSITION FOR PREVENTING UNEVENNESS
The present invention relates to a resist stripper composition for preventing staining, comprising: (a) a glycol ether represented by chemical formula 1, R-(OCH_2CH_2)n-OH; (b) an alkaline compound; (c) a non-protic polar solvent; and (d) a corrosion inhibitor. In the chemical formula 1, R is a meth...
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| creator | SHIN HYE RA LEE YU JIN KO KYUNG JUN |
| description | The present invention relates to a resist stripper composition for preventing staining, comprising: (a) a glycol ether represented by chemical formula 1, R-(OCH_2CH_2)n-OH; (b) an alkaline compound; (c) a non-protic polar solvent; and (d) a corrosion inhibitor. In the chemical formula 1, R is a methyl group or an ethyl group, and n is an integer of 2 to 3.
본 발명은 (a) 화학식 1로 표시되는 글리콜 에테르(Glycol ether), (b) 알카리계 화합물, (c) 비 양자성 극성용매 및 (d) 부식방지제를 포함하는 얼룩 발생 방지를 위한 레지스트 박리액 조성물에 관한 것이다. [화학식 1]상기 화학식 1에서, R은 메틸기 또는 에틸기이며, n은 2 내지 3의 정수이다. |
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본 발명은 (a) 화학식 1로 표시되는 글리콜 에테르(Glycol ether), (b) 알카리계 화합물, (c) 비 양자성 극성용매 및 (d) 부식방지제를 포함하는 얼룩 발생 방지를 위한 레지스트 박리액 조성물에 관한 것이다. [화학식 1]상기 화학식 1에서, R은 메틸기 또는 에틸기이며, n은 2 내지 3의 정수이다.</description><language>eng ; kor</language><subject>ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES ; APPARATUS SPECIALLY ADAPTED THEREFOR ; CANDLES ; CHEMISTRY ; CINEMATOGRAPHY ; DETERGENT COMPOSITIONS ; DETERGENTS ; ELECTROGRAPHY ; FATTY ACIDS THEREFROM ; HOLOGRAPHY ; MATERIALS THEREFOR ; METALLURGY ; ORIGINALS THEREFOR ; PHOTOGRAPHY ; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES ; PHYSICS ; RECOVERY OF GLYCEROL ; RESIN SOAPS ; SOAP OR SOAP-MAKING ; USE OF SINGLE SUBSTANCES AS DETERGENTS</subject><creationdate>2019</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20191014&DB=EPODOC&CC=KR&NR=20190116211A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25564,76547</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20191014&DB=EPODOC&CC=KR&NR=20190116211A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>SHIN HYE RA</creatorcontrib><creatorcontrib>LEE YU JIN</creatorcontrib><creatorcontrib>KO KYUNG JUN</creatorcontrib><title>A RESIST STRIPPER COMPOSITION FOR PREVENTING UNEVENNESS</title><description>The present invention relates to a resist stripper composition for preventing staining, comprising: (a) a glycol ether represented by chemical formula 1, R-(OCH_2CH_2)n-OH; (b) an alkaline compound; (c) a non-protic polar solvent; and (d) a corrosion inhibitor. In the chemical formula 1, R is a methyl group or an ethyl group, and n is an integer of 2 to 3.
본 발명은 (a) 화학식 1로 표시되는 글리콜 에테르(Glycol ether), (b) 알카리계 화합물, (c) 비 양자성 극성용매 및 (d) 부식방지제를 포함하는 얼룩 발생 방지를 위한 레지스트 박리액 조성물에 관한 것이다. [화학식 1]상기 화학식 1에서, R은 메틸기 또는 에틸기이며, n은 2 내지 3의 정수이다.</description><subject>ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES</subject><subject>APPARATUS SPECIALLY ADAPTED THEREFOR</subject><subject>CANDLES</subject><subject>CHEMISTRY</subject><subject>CINEMATOGRAPHY</subject><subject>DETERGENT COMPOSITIONS</subject><subject>DETERGENTS</subject><subject>ELECTROGRAPHY</subject><subject>FATTY ACIDS THEREFROM</subject><subject>HOLOGRAPHY</subject><subject>MATERIALS THEREFOR</subject><subject>METALLURGY</subject><subject>ORIGINALS THEREFOR</subject><subject>PHOTOGRAPHY</subject><subject>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</subject><subject>PHYSICS</subject><subject>RECOVERY OF GLYCEROL</subject><subject>RESIN SOAPS</subject><subject>SOAP OR SOAP-MAKING</subject><subject>USE OF SINGLE SUBSTANCES AS DETERGENTS</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2019</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZDB3VAhyDfYMDlEIDgnyDAhwDVJw9vcN8A_2DPH091Nw8w9SCAhyDXP1C_H0c1cI9QMx_VyDg3kYWNMSc4pTeaE0N4Oym2uIs4duakF-fGpxQWJyal5qSbx3kJGBoaWBoaGZkaGhozFxqgAU0ymF</recordid><startdate>20191014</startdate><enddate>20191014</enddate><creator>SHIN HYE RA</creator><creator>LEE YU JIN</creator><creator>KO KYUNG JUN</creator><scope>EVB</scope></search><sort><creationdate>20191014</creationdate><title>A RESIST STRIPPER COMPOSITION FOR PREVENTING UNEVENNESS</title><author>SHIN HYE RA ; LEE YU JIN ; KO KYUNG JUN</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_KR20190116211A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng ; kor</language><creationdate>2019</creationdate><topic>ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES</topic><topic>APPARATUS SPECIALLY ADAPTED THEREFOR</topic><topic>CANDLES</topic><topic>CHEMISTRY</topic><topic>CINEMATOGRAPHY</topic><topic>DETERGENT COMPOSITIONS</topic><topic>DETERGENTS</topic><topic>ELECTROGRAPHY</topic><topic>FATTY ACIDS THEREFROM</topic><topic>HOLOGRAPHY</topic><topic>MATERIALS THEREFOR</topic><topic>METALLURGY</topic><topic>ORIGINALS THEREFOR</topic><topic>PHOTOGRAPHY</topic><topic>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</topic><topic>PHYSICS</topic><topic>RECOVERY OF GLYCEROL</topic><topic>RESIN SOAPS</topic><topic>SOAP OR SOAP-MAKING</topic><topic>USE OF SINGLE SUBSTANCES AS DETERGENTS</topic><toplevel>online_resources</toplevel><creatorcontrib>SHIN HYE RA</creatorcontrib><creatorcontrib>LEE YU JIN</creatorcontrib><creatorcontrib>KO KYUNG JUN</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>SHIN HYE RA</au><au>LEE YU JIN</au><au>KO KYUNG JUN</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>A RESIST STRIPPER COMPOSITION FOR PREVENTING UNEVENNESS</title><date>2019-10-14</date><risdate>2019</risdate><abstract>The present invention relates to a resist stripper composition for preventing staining, comprising: (a) a glycol ether represented by chemical formula 1, R-(OCH_2CH_2)n-OH; (b) an alkaline compound; (c) a non-protic polar solvent; and (d) a corrosion inhibitor. In the chemical formula 1, R is a methyl group or an ethyl group, and n is an integer of 2 to 3.
본 발명은 (a) 화학식 1로 표시되는 글리콜 에테르(Glycol ether), (b) 알카리계 화합물, (c) 비 양자성 극성용매 및 (d) 부식방지제를 포함하는 얼룩 발생 방지를 위한 레지스트 박리액 조성물에 관한 것이다. [화학식 1]상기 화학식 1에서, R은 메틸기 또는 에틸기이며, n은 2 내지 3의 정수이다.</abstract><oa>free_for_read</oa></addata></record> |
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| subjects | ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES APPARATUS SPECIALLY ADAPTED THEREFOR CANDLES CHEMISTRY CINEMATOGRAPHY DETERGENT COMPOSITIONS DETERGENTS ELECTROGRAPHY FATTY ACIDS THEREFROM HOLOGRAPHY MATERIALS THEREFOR METALLURGY ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS RECOVERY OF GLYCEROL RESIN SOAPS SOAP OR SOAP-MAKING USE OF SINGLE SUBSTANCES AS DETERGENTS |
| title | A RESIST STRIPPER COMPOSITION FOR PREVENTING UNEVENNESS |
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