A RESIST STRIPPER COMPOSITION FOR PREVENTING UNEVENNESS

The present invention relates to a resist stripper composition for preventing staining, comprising: (a) a glycol ether represented by chemical formula 1, R-(OCH_2CH_2)n-OH; (b) an alkaline compound; (c) a non-protic polar solvent; and (d) a corrosion inhibitor. In the chemical formula 1, R is a meth...

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Bibliographische Detailangaben
Hauptverfasser:	SHIN HYE RA, LEE YU JIN, KO KYUNG JUN
Format:	Patent
Sprache:	eng ; kor
Schlagworte:	ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES APPARATUS SPECIALLY ADAPTED THEREFOR CANDLES CHEMISTRY CINEMATOGRAPHY DETERGENT COMPOSITIONS DETERGENTS ELECTROGRAPHY FATTY ACIDS THEREFROM HOLOGRAPHY MATERIALS THEREFOR METALLURGY ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS RECOVERY OF GLYCEROL RESIN SOAPS SOAP OR SOAP-MAKING USE OF SINGLE SUBSTANCES AS DETERGENTS
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Beschreibung
Zusammenfassung:	The present invention relates to a resist stripper composition for preventing staining, comprising: (a) a glycol ether represented by chemical formula 1, R-(OCH_2CH_2)n-OH; (b) an alkaline compound; (c) a non-protic polar solvent; and (d) a corrosion inhibitor. In the chemical formula 1, R is a methyl group or an ethyl group, and n is an integer of 2 to 3. 본 발명은 (a) 화학식 1로 표시되는 글리콜 에테르(Glycol ether), (b) 알카리계 화합물, (c) 비 양자성 극성용매 및 (d) 부식방지제를 포함하는 얼룩 발생 방지를 위한 레지스트 박리액 조성물에 관한 것이다. [화학식 1]상기 화학식 1에서, R은 메틸기 또는 에틸기이며, n은 2 내지 3의 정수이다.