SUBSTRATE PROCESSING APPARATUS AND CONTROL METHOD THEREOF FILM FORMATION APPARATUS MANUFACTURING METHOD OF ELECTRONIC COMPONENT

The present invention is to provide a technique capable of efficiently performing surface treatment on the surface of a substrate. A substrate processing apparatus includes: a support means for supporting a substrate; a first ion source and a second ion source disposed in a positional relationship l...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	WATABE ARATA, ABE YOSHIKO, TAKEMI TAKASHI, ABE YAMATO
Format:	Patent
Sprache:	eng ; kor
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
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