THERMAL PLASMA TORCH

The present invention relates to a thermal plasma torch used for processing PFC gas in semiconductor industries. The thermal plasma torch comprises: a negative electrode unit having a negative electrode; and positive electrode units having a positive electrode insulated with the negative electrode b...

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Bibliographische Detailangaben
1. Verfasser:	CHOI, WOON SUN
Format:	Patent
Sprache:	eng ; kor
Schlagworte:	ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR ELECTRICITY PLASMA TECHNIQUE PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OFNEUTRONS PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMICBEAMS
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Beschreibung
Zusammenfassung:	The present invention relates to a thermal plasma torch used for processing PFC gas in semiconductor industries. The thermal plasma torch comprises: a negative electrode unit having a negative electrode; and positive electrode units having a positive electrode insulated with the negative electrode by an insulator. The positive electrode units are sequentially located up and down. Each of the positive electrodes applies an electric current by a physical contact and has the same electrical properties as a single positive electrode. 이하 개시된 내용은, 주로 반도체 산업에서 PFC 가스 처리용으로 사용되는 열플라즈마 토치에 관한 것이다. 바람직한 실시예의 열플라즈마 토치는, 음극전극을 구비한 음극부와 절연체에 의해 음극전극과 절연된 양극전극을 구비한 양극부를 포함할 수 있다. 여기서, 양극부는 복수개로 이루어져 각각 상하로 차례대로 위치하고, 각각의 양극전극이 물리적 접촉에 의해 통전되어 단일의 양극전극과 동일한 전기적 성질을 갖는 것을 특징으로 한다.