COMPOSITION FOR FORMING INSULATION LAYER AND INSULATION LAYER FORMED FROM THE SAME
Embodiments of the present invention provides a composition which comprises a silica sol, a porogen, and a thermal acid generator, and is able to form an insulation layer having a low dielectric constant and high elastic properties. The silica sol can be formed from a silane compound comprising a te...
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| creator | YANG DON SIK CHOI HAN YOUNG KUM JOONG HAN |
| description | Embodiments of the present invention provides a composition which comprises a silica sol, a porogen, and a thermal acid generator, and is able to form an insulation layer having a low dielectric constant and high elastic properties. The silica sol can be formed from a silane compound comprising a tertiary silane compound and a cyclic siloxane structure.
본 발명의 실시예들은 실리카 졸, 포로젠(porogen), 및 열산 발생제를 포함하며, 저유전율, 고탄성 특성을 갖는 절연막을 형성할 수 있는 조성물을 제공한다. |
| format | Patent |
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본 발명의 실시예들은 실리카 졸, 포로젠(porogen), 및 열산 발생제를 포함하며, 저유전율, 고탄성 특성을 갖는 절연막을 형성할 수 있는 조성물을 제공한다.</description><language>eng ; kor</language><subject>BASIC ELECTRIC ELEMENTS ; CABLES ; CONDUCTORS ; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ; ELECTRICITY ; INSULATORS ; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING ORDIELECTRIC PROPERTIES ; SEMICONDUCTOR DEVICES</subject><creationdate>2019</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20190731&DB=EPODOC&CC=KR&NR=20190089575A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25542,76289</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20190731&DB=EPODOC&CC=KR&NR=20190089575A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>YANG DON SIK</creatorcontrib><creatorcontrib>CHOI HAN YOUNG</creatorcontrib><creatorcontrib>KUM JOONG HAN</creatorcontrib><title>COMPOSITION FOR FORMING INSULATION LAYER AND INSULATION LAYER FORMED FROM THE SAME</title><description>Embodiments of the present invention provides a composition which comprises a silica sol, a porogen, and a thermal acid generator, and is able to form an insulation layer having a low dielectric constant and high elastic properties. The silica sol can be formed from a silane compound comprising a tertiary silane compound and a cyclic siloxane structure.
본 발명의 실시예들은 실리카 졸, 포로젠(porogen), 및 열산 발생제를 포함하며, 저유전율, 고탄성 특성을 갖는 절연막을 형성할 수 있는 조성물을 제공한다.</description><subject>BASIC ELECTRIC ELEMENTS</subject><subject>CABLES</subject><subject>CONDUCTORS</subject><subject>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</subject><subject>ELECTRICITY</subject><subject>INSULATORS</subject><subject>SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING ORDIELECTRIC PROPERTIES</subject><subject>SEMICONDUCTOR DEVICES</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2019</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZAhy9vcN8A_2DPH091Nw8w8CYV9PP3cFT7_gUB9HsLCPY6RrkIKjnwumIEi1q4uCW5C_r0KIh6tCsKOvKw8Da1piTnEqL5TmZlB2cw1x9tBNLciPTy0uSExOzUstifcOMjIwtDQwsLA0NTd1NCZOFQCwLTCv</recordid><startdate>20190731</startdate><enddate>20190731</enddate><creator>YANG DON SIK</creator><creator>CHOI HAN YOUNG</creator><creator>KUM JOONG HAN</creator><scope>EVB</scope></search><sort><creationdate>20190731</creationdate><title>COMPOSITION FOR FORMING INSULATION LAYER AND INSULATION LAYER FORMED FROM THE SAME</title><author>YANG DON SIK ; CHOI HAN YOUNG ; KUM JOONG HAN</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_KR20190089575A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng ; kor</language><creationdate>2019</creationdate><topic>BASIC ELECTRIC ELEMENTS</topic><topic>CABLES</topic><topic>CONDUCTORS</topic><topic>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</topic><topic>ELECTRICITY</topic><topic>INSULATORS</topic><topic>SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING ORDIELECTRIC PROPERTIES</topic><topic>SEMICONDUCTOR DEVICES</topic><toplevel>online_resources</toplevel><creatorcontrib>YANG DON SIK</creatorcontrib><creatorcontrib>CHOI HAN YOUNG</creatorcontrib><creatorcontrib>KUM JOONG HAN</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>YANG DON SIK</au><au>CHOI HAN YOUNG</au><au>KUM JOONG HAN</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>COMPOSITION FOR FORMING INSULATION LAYER AND INSULATION LAYER FORMED FROM THE SAME</title><date>2019-07-31</date><risdate>2019</risdate><abstract>Embodiments of the present invention provides a composition which comprises a silica sol, a porogen, and a thermal acid generator, and is able to form an insulation layer having a low dielectric constant and high elastic properties. The silica sol can be formed from a silane compound comprising a tertiary silane compound and a cyclic siloxane structure.
본 발명의 실시예들은 실리카 졸, 포로젠(porogen), 및 열산 발생제를 포함하며, 저유전율, 고탄성 특성을 갖는 절연막을 형성할 수 있는 조성물을 제공한다.</abstract><oa>free_for_read</oa></addata></record> |
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| subjects | BASIC ELECTRIC ELEMENTS CABLES CONDUCTORS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY INSULATORS SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING ORDIELECTRIC PROPERTIES SEMICONDUCTOR DEVICES |
| title | COMPOSITION FOR FORMING INSULATION LAYER AND INSULATION LAYER FORMED FROM THE SAME |
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