COMPOSITION FOR FORMING INSULATION LAYER AND INSULATION LAYER FORMED FROM THE SAME

Embodiments of the present invention provides a composition which comprises a silica sol, a porogen, and a thermal acid generator, and is able to form an insulation layer having a low dielectric constant and high elastic properties. The silica sol can be formed from a silane compound comprising a te...

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Bibliographische Detailangaben
Hauptverfasser:	YANG DON SIK, CHOI HAN YOUNG, KUM JOONG HAN
Format:	Patent
Sprache:	eng ; kor
Schlagworte:	BASIC ELECTRIC ELEMENTS CABLES CONDUCTORS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY INSULATORS SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING ORDIELECTRIC PROPERTIES SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:	Embodiments of the present invention provides a composition which comprises a silica sol, a porogen, and a thermal acid generator, and is able to form an insulation layer having a low dielectric constant and high elastic properties. The silica sol can be formed from a silane compound comprising a tertiary silane compound and a cyclic siloxane structure. 본 발명의 실시예들은 실리카 졸, 포로젠(porogen), 및 열산 발생제를 포함하며, 저유전율, 고탄성 특성을 갖는 절연막을 형성할 수 있는 조성물을 제공한다.