Linear evaporation source

Disclosed is a linear evaporation source for high temperature. According to an embodiment of the present invention, the linear evaporation source for high temperature comprises: a block housing configured to form an appearance of equipment, and having a lower cooling block; a crucible disposed in th...

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Hauptverfasser: KIM YOUNG DO, KANG JIN GEON
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creator KIM YOUNG DO
KANG JIN GEON
description Disclosed is a linear evaporation source for high temperature. According to an embodiment of the present invention, the linear evaporation source for high temperature comprises: a block housing configured to form an appearance of equipment, and having a lower cooling block; a crucible disposed in the block housing and filled with an evaporation material; and a crucible lower support unit disposed on the lower cooling block in the block housing and supporting an area of a lower portion of the crucible in a corresponding position. 고온용 선형 증착원이 개시된다. 본 발명의 일 실시예에 따른 고온용 선형 증착원은, 장비의 외관을 형성하되 하부 쿨링 블록(cooling block)을 구비하는 블록 하우징(block housing); 블록 하우징 내에 배치되며, 증착물질이 내부에 충전되는 크루시블(crucible); 및 블록 하우징 내에서 하부 쿨링 블록 상에 배치되며, 해당 위치에서 크루시블의 하부 일 영역을 받쳐 지지하는 크루시블 하부 받침유닛을 포함한다.
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fullrecord <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_KR20190080372A</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>KR20190080372A</sourcerecordid><originalsourceid>FETCH-epo_espacenet_KR20190080372A3</originalsourceid><addsrcrecordid>eNrjZJD0ycxLTSxSSC1LLMgvSizJzM9TKM4vLUpO5WFgTUvMKU7lhdLcDMpuriHOHrqpBfnxqcUFicmpeakl8d5BRgaGlgYGFgbG5kaOxsSpAgC60COw</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>Linear evaporation source</title><source>esp@cenet</source><creator>KIM YOUNG DO ; KANG JIN GEON</creator><creatorcontrib>KIM YOUNG DO ; KANG JIN GEON</creatorcontrib><description>Disclosed is a linear evaporation source for high temperature. According to an embodiment of the present invention, the linear evaporation source for high temperature comprises: a block housing configured to form an appearance of equipment, and having a lower cooling block; a crucible disposed in the block housing and filled with an evaporation material; and a crucible lower support unit disposed on the lower cooling block in the block housing and supporting an area of a lower portion of the crucible in a corresponding position. 고온용 선형 증착원이 개시된다. 본 발명의 일 실시예에 따른 고온용 선형 증착원은, 장비의 외관을 형성하되 하부 쿨링 블록(cooling block)을 구비하는 블록 하우징(block housing); 블록 하우징 내에 배치되며, 증착물질이 내부에 충전되는 크루시블(crucible); 및 블록 하우징 내에서 하부 쿨링 블록 상에 배치되며, 해당 위치에서 크루시블의 하부 일 영역을 받쳐 지지하는 크루시블 하부 받침유닛을 포함한다.</description><language>eng ; kor</language><subject>BLASTING ; CHEMICAL SURFACE TREATMENT ; CHEMISTRY ; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL ; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL ; COATING MATERIAL WITH METALLIC MATERIAL ; COATING METALLIC MATERIAL ; DIFFUSION TREATMENT OF METALLIC MATERIAL ; FURNACES ; FURNACES, KILNS, OVENS, OR RETORTS IN GENERAL ; HEATING ; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL ; KILNS ; LIGHTING ; MECHANICAL ENGINEERING ; METALLURGY ; OPEN SINTERING OR LIKE APPARATUS ; OVENS ; RETORTS ; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION ; WEAPONS</subject><creationdate>2019</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20190708&amp;DB=EPODOC&amp;CC=KR&amp;NR=20190080372A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25564,76547</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20190708&amp;DB=EPODOC&amp;CC=KR&amp;NR=20190080372A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>KIM YOUNG DO</creatorcontrib><creatorcontrib>KANG JIN GEON</creatorcontrib><title>Linear evaporation source</title><description>Disclosed is a linear evaporation source for high temperature. According to an embodiment of the present invention, the linear evaporation source for high temperature comprises: a block housing configured to form an appearance of equipment, and having a lower cooling block; a crucible disposed in the block housing and filled with an evaporation material; and a crucible lower support unit disposed on the lower cooling block in the block housing and supporting an area of a lower portion of the crucible in a corresponding position. 고온용 선형 증착원이 개시된다. 본 발명의 일 실시예에 따른 고온용 선형 증착원은, 장비의 외관을 형성하되 하부 쿨링 블록(cooling block)을 구비하는 블록 하우징(block housing); 블록 하우징 내에 배치되며, 증착물질이 내부에 충전되는 크루시블(crucible); 및 블록 하우징 내에서 하부 쿨링 블록 상에 배치되며, 해당 위치에서 크루시블의 하부 일 영역을 받쳐 지지하는 크루시블 하부 받침유닛을 포함한다.</description><subject>BLASTING</subject><subject>CHEMICAL SURFACE TREATMENT</subject><subject>CHEMISTRY</subject><subject>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</subject><subject>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</subject><subject>COATING MATERIAL WITH METALLIC MATERIAL</subject><subject>COATING METALLIC MATERIAL</subject><subject>DIFFUSION TREATMENT OF METALLIC MATERIAL</subject><subject>FURNACES</subject><subject>FURNACES, KILNS, OVENS, OR RETORTS IN GENERAL</subject><subject>HEATING</subject><subject>INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL</subject><subject>KILNS</subject><subject>LIGHTING</subject><subject>MECHANICAL ENGINEERING</subject><subject>METALLURGY</subject><subject>OPEN SINTERING OR LIKE APPARATUS</subject><subject>OVENS</subject><subject>RETORTS</subject><subject>SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</subject><subject>WEAPONS</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2019</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZJD0ycxLTSxSSC1LLMgvSizJzM9TKM4vLUpO5WFgTUvMKU7lhdLcDMpuriHOHrqpBfnxqcUFicmpeakl8d5BRgaGlgYGFgbG5kaOxsSpAgC60COw</recordid><startdate>20190708</startdate><enddate>20190708</enddate><creator>KIM YOUNG DO</creator><creator>KANG JIN GEON</creator><scope>EVB</scope></search><sort><creationdate>20190708</creationdate><title>Linear evaporation source</title><author>KIM YOUNG DO ; KANG JIN GEON</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_KR20190080372A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng ; kor</language><creationdate>2019</creationdate><topic>BLASTING</topic><topic>CHEMICAL SURFACE TREATMENT</topic><topic>CHEMISTRY</topic><topic>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</topic><topic>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</topic><topic>COATING MATERIAL WITH METALLIC MATERIAL</topic><topic>COATING METALLIC MATERIAL</topic><topic>DIFFUSION TREATMENT OF METALLIC MATERIAL</topic><topic>FURNACES</topic><topic>FURNACES, KILNS, OVENS, OR RETORTS IN GENERAL</topic><topic>HEATING</topic><topic>INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL</topic><topic>KILNS</topic><topic>LIGHTING</topic><topic>MECHANICAL ENGINEERING</topic><topic>METALLURGY</topic><topic>OPEN SINTERING OR LIKE APPARATUS</topic><topic>OVENS</topic><topic>RETORTS</topic><topic>SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</topic><topic>WEAPONS</topic><toplevel>online_resources</toplevel><creatorcontrib>KIM YOUNG DO</creatorcontrib><creatorcontrib>KANG JIN GEON</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>KIM YOUNG DO</au><au>KANG JIN GEON</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Linear evaporation source</title><date>2019-07-08</date><risdate>2019</risdate><abstract>Disclosed is a linear evaporation source for high temperature. According to an embodiment of the present invention, the linear evaporation source for high temperature comprises: a block housing configured to form an appearance of equipment, and having a lower cooling block; a crucible disposed in the block housing and filled with an evaporation material; and a crucible lower support unit disposed on the lower cooling block in the block housing and supporting an area of a lower portion of the crucible in a corresponding position. 고온용 선형 증착원이 개시된다. 본 발명의 일 실시예에 따른 고온용 선형 증착원은, 장비의 외관을 형성하되 하부 쿨링 블록(cooling block)을 구비하는 블록 하우징(block housing); 블록 하우징 내에 배치되며, 증착물질이 내부에 충전되는 크루시블(crucible); 및 블록 하우징 내에서 하부 쿨링 블록 상에 배치되며, 해당 위치에서 크루시블의 하부 일 영역을 받쳐 지지하는 크루시블 하부 받침유닛을 포함한다.</abstract><oa>free_for_read</oa></addata></record>
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subjects BLASTING
CHEMICAL SURFACE TREATMENT
CHEMISTRY
COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
COATING MATERIAL WITH METALLIC MATERIAL
COATING METALLIC MATERIAL
DIFFUSION TREATMENT OF METALLIC MATERIAL
FURNACES
FURNACES, KILNS, OVENS, OR RETORTS IN GENERAL
HEATING
INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL
KILNS
LIGHTING
MECHANICAL ENGINEERING
METALLURGY
OPEN SINTERING OR LIKE APPARATUS
OVENS
RETORTS
SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
WEAPONS
title Linear evaporation source
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