COMPOSITION FOR FORMING SILICA LAYER SILICA LAYER AND ELECTRONIC DEVICE

The present invention relates to a composition for forming a silica film, which comprises a silicon-containing polymer and a solvent. The weight average molecular weight (Mw1) of the silicon-containing polymer is 1,000 to 20,000, the silicon-containing polymer is that the molecular weight (Mw2) of a...

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Bibliographische Detailangaben
Hauptverfasser:	BAE, JIN HEE, NOH, KUN BAE, SAKONG, JUN, JANG, JUN YOUNG, HWANG, BYEONG GYU, KWAK, TAEK SOO
Format:	Patent
Sprache:	eng ; kor
Schlagworte:	ADHESIVES CHEMICAL PAINT OR INK REMOVERS CHEMISTRY COATING COMPOSITIONS, e.g. PAINTS, VARNISHES ORLACQUERS CORRECTING FLUIDS DYES FILLING PASTES INKS METALLURGY MISCELLANEOUS APPLICATIONS OF MATERIALS MISCELLANEOUS COMPOSITIONS NATURAL RESINS PAINTS PASTES OR SOLIDS FOR COLOURING OR PRINTING POLISHES USE OF MATERIALS THEREFOR WOODSTAINS
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Beschreibung
Zusammenfassung:	The present invention relates to a composition for forming a silica film, which comprises a silicon-containing polymer and a solvent. The weight average molecular weight (Mw1) of the silicon-containing polymer is 1,000 to 20,000, the silicon-containing polymer is that the molecular weight (Mw2) of a polar polymer detected when measured by a multi-angle light scattering system (MALS) is 50,000 to 200,000, and the polar polymer has a peak area of 3% or less with respect to the silicon-containing polymer when measured by the multi-angle light scattering system (MALS). 규소 함유 중합체 및 용매를 포함하는 실리카 막 형성용 조성물로서, 상기 규소 함유 중합체의 중량평균분자량(Mw1)은 1,000 내지 20,000이고, 상기 규소 함유 중합체는 다각도 광산란 검출기(MALS) 측정시 검출되는 극 고분자의 분자량(Mw2)이 50,000 내지 200,000이고, 상기 극 고분자는 다각도 광산란 검출기(MALS) 측정시 상기 규소 함유 중합체에 대하여 3% 이하의 피크 면적을 가지는 실리카 막 형성용 조성물을 제공한다.