SEMICONDUCTOR DEVICE

According to one embodiment of the present invention, a semiconductor device comprises: a substrate; an n- type layer; an n+ type region; a p type region; a p+ type region; a gate insulating film; a gate electrode; a source electrode; and a drain electrode. The n+ type region is located on left and...

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Bibliographische Detailangaben
1. Verfasser: CHUN, DAE HWAN
Format: Patent
Sprache:eng ; kor
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