A POLISHING PAD HAVING INTERNAL CHANNEL AND A METHOD OF PREPARING THE SAME

Provided are a polishing pad including an internal channel and a manufacturing method thereof. The internal channel penetrates the polishing pad, and an opening part of the internal channel is located on a polishing surface of the polishing pad. Therefore, the present invention is capable of reducin...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	LEE TAE WOO, KIM PAL KON
Format:	Patent
Sprache:	eng ; kor
Schlagworte:	BASIC ELECTRIC ELEMENTS DRESSING OR CONDITIONING OF ABRADING SURFACES ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS GRINDING MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING PERFORMING OPERATIONS POLISHING SEMICONDUCTOR DEVICES TRANSPORTING
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