VAPOR DEPOSITION APPARATUS

The present invention provides a vapor deposition apparatus which can reduce a difference between a temperature of an adjustment target such as a substrate or a deposition mask and a target temperature. At least one side of a substrate (W) and a deposition mask (M) is an adjustment target for temper...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	YANAGIHORI FUMITSUGU, YOSHIDA YUICHI
Format:	Patent
Sprache:	eng ; kor
Schlagworte:	CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
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