Expansion method for sheath and bulk of microwave plasma induced by Radio Frequency bias
The objective of the present invention is to provide a method for expanding a sheath and a bulk of plasma by using a dual high frequency for expanding a sheath and a bulk of plasma generated as a microwave. According to an embodiment of the present invention, the method for expanding a sheath and a...
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| creator | YUN, GUN SU LEE, JI MO LEE, SEUNG TAEK LEE, JAE KOO NAM, WOO JIN |
| description | The objective of the present invention is to provide a method for expanding a sheath and a bulk of plasma by using a dual high frequency for expanding a sheath and a bulk of plasma generated as a microwave. According to an embodiment of the present invention, the method for expanding a sheath and a bulk of plasma by using a dual high frequency comprises: a generation step of generating plasma by using a microwave plasma generator; and an expansion step of applying a radio frequency (RF) to an RF electrode arranged to be separated from the microwave plasma generator by a set distance so as to expand a sheath and a bulk of the plasma.
본 발명의 목적은 마이크로파로 생성된 플라즈마의 시스와 벌크를 확장하는 이중의 고주파수를 이용한 플라즈마의 시스와 벌크의 확장방법을 제공하는 것이다. 본 발명의 일 실시예에 따른 이중의 고주파수를 이용한 플라즈마의 시스와 벌크의 확장방법은, 마이크로파 플라즈마 발생기로 플라즈마를 생성하는 생성단계, 및 상기 마이크로파 플라즈마 발생기와 설정 간격으로 이격 배치되는 무선주파수 전극에 무선주파수(RF)를 바이어스 인가하여 상기 플라즈마의 시스와 벌크를 확장하는 확장단계를 포함한다. |
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본 발명의 목적은 마이크로파로 생성된 플라즈마의 시스와 벌크를 확장하는 이중의 고주파수를 이용한 플라즈마의 시스와 벌크의 확장방법을 제공하는 것이다. 본 발명의 일 실시예에 따른 이중의 고주파수를 이용한 플라즈마의 시스와 벌크의 확장방법은, 마이크로파 플라즈마 발생기로 플라즈마를 생성하는 생성단계, 및 상기 마이크로파 플라즈마 발생기와 설정 간격으로 이격 배치되는 무선주파수 전극에 무선주파수(RF)를 바이어스 인가하여 상기 플라즈마의 시스와 벌크를 확장하는 확장단계를 포함한다.</description><language>eng ; kor</language><subject>ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR ; ELECTRICITY ; PLASMA TECHNIQUE ; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OFNEUTRONS ; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMICBEAMS</subject><creationdate>2019</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20190612&DB=EPODOC&CC=KR&NR=20190065854A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25542,76289</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20190612&DB=EPODOC&CC=KR&NR=20190065854A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>YUN, GUN SU</creatorcontrib><creatorcontrib>LEE, JI MO</creatorcontrib><creatorcontrib>LEE, SEUNG TAEK</creatorcontrib><creatorcontrib>LEE, JAE KOO</creatorcontrib><creatorcontrib>NAM, WOO JIN</creatorcontrib><title>Expansion method for sheath and bulk of microwave plasma induced by Radio Frequency bias</title><description>The objective of the present invention is to provide a method for expanding a sheath and a bulk of plasma by using a dual high frequency for expanding a sheath and a bulk of plasma generated as a microwave. According to an embodiment of the present invention, the method for expanding a sheath and a bulk of plasma by using a dual high frequency comprises: a generation step of generating plasma by using a microwave plasma generator; and an expansion step of applying a radio frequency (RF) to an RF electrode arranged to be separated from the microwave plasma generator by a set distance so as to expand a sheath and a bulk of the plasma.
본 발명의 목적은 마이크로파로 생성된 플라즈마의 시스와 벌크를 확장하는 이중의 고주파수를 이용한 플라즈마의 시스와 벌크의 확장방법을 제공하는 것이다. 본 발명의 일 실시예에 따른 이중의 고주파수를 이용한 플라즈마의 시스와 벌크의 확장방법은, 마이크로파 플라즈마 발생기로 플라즈마를 생성하는 생성단계, 및 상기 마이크로파 플라즈마 발생기와 설정 간격으로 이격 배치되는 무선주파수 전극에 무선주파수(RF)를 바이어스 인가하여 상기 플라즈마의 시스와 벌크를 확장하는 확장단계를 포함한다.</description><subject>ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR</subject><subject>ELECTRICITY</subject><subject>PLASMA TECHNIQUE</subject><subject>PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OFNEUTRONS</subject><subject>PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMICBEAMS</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2019</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNqNyr0KwjAQAOAuDqK-w4GzEH9adBRpEdyKg1u5JlcSbHIxadS-vQ4-gNO3fNPsVr49umjYgaVBs4KOA0RNOGhAp6BN_R24A2tk4Bc-CXyP0SIYp5KkbxihRmUYqkCPRE6O0BqM82zSYR9p8XOWLavyejqvyHND0aMkR0NzqTdifRCiyPf57rj9b30AUOo6vQ</recordid><startdate>20190612</startdate><enddate>20190612</enddate><creator>YUN, GUN SU</creator><creator>LEE, JI MO</creator><creator>LEE, SEUNG TAEK</creator><creator>LEE, JAE KOO</creator><creator>NAM, WOO JIN</creator><scope>EVB</scope></search><sort><creationdate>20190612</creationdate><title>Expansion method for sheath and bulk of microwave plasma induced by Radio Frequency bias</title><author>YUN, GUN SU ; LEE, JI MO ; LEE, SEUNG TAEK ; LEE, JAE KOO ; NAM, WOO JIN</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_KR20190065854A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng ; kor</language><creationdate>2019</creationdate><topic>ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR</topic><topic>ELECTRICITY</topic><topic>PLASMA TECHNIQUE</topic><topic>PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OFNEUTRONS</topic><topic>PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMICBEAMS</topic><toplevel>online_resources</toplevel><creatorcontrib>YUN, GUN SU</creatorcontrib><creatorcontrib>LEE, JI MO</creatorcontrib><creatorcontrib>LEE, SEUNG TAEK</creatorcontrib><creatorcontrib>LEE, JAE KOO</creatorcontrib><creatorcontrib>NAM, WOO JIN</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>YUN, GUN SU</au><au>LEE, JI MO</au><au>LEE, SEUNG TAEK</au><au>LEE, JAE KOO</au><au>NAM, WOO JIN</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Expansion method for sheath and bulk of microwave plasma induced by Radio Frequency bias</title><date>2019-06-12</date><risdate>2019</risdate><abstract>The objective of the present invention is to provide a method for expanding a sheath and a bulk of plasma by using a dual high frequency for expanding a sheath and a bulk of plasma generated as a microwave. According to an embodiment of the present invention, the method for expanding a sheath and a bulk of plasma by using a dual high frequency comprises: a generation step of generating plasma by using a microwave plasma generator; and an expansion step of applying a radio frequency (RF) to an RF electrode arranged to be separated from the microwave plasma generator by a set distance so as to expand a sheath and a bulk of the plasma.
본 발명의 목적은 마이크로파로 생성된 플라즈마의 시스와 벌크를 확장하는 이중의 고주파수를 이용한 플라즈마의 시스와 벌크의 확장방법을 제공하는 것이다. 본 발명의 일 실시예에 따른 이중의 고주파수를 이용한 플라즈마의 시스와 벌크의 확장방법은, 마이크로파 플라즈마 발생기로 플라즈마를 생성하는 생성단계, 및 상기 마이크로파 플라즈마 발생기와 설정 간격으로 이격 배치되는 무선주파수 전극에 무선주파수(RF)를 바이어스 인가하여 상기 플라즈마의 시스와 벌크를 확장하는 확장단계를 포함한다.</abstract><oa>free_for_read</oa></addata></record> |
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| title | Expansion method for sheath and bulk of microwave plasma induced by Radio Frequency bias |
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