Expansion method for sheath and bulk of microwave plasma induced by Radio Frequency bias

The objective of the present invention is to provide a method for expanding a sheath and a bulk of plasma by using a dual high frequency for expanding a sheath and a bulk of plasma generated as a microwave. According to an embodiment of the present invention, the method for expanding a sheath and a...

Ausführliche Beschreibung

Gespeichert in:

Bibliographische Detailangaben
Hauptverfasser:	YUN, GUN SU, LEE, JI MO, LEE, SEUNG TAEK, LEE, JAE KOO, NAM, WOO JIN
Format:	Patent
Sprache:	eng ; kor
Schlagworte:	ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR ELECTRICITY PLASMA TECHNIQUE PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OFNEUTRONS PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMICBEAMS
Online-Zugang:	Volltext bestellen
Tags:	Tag hinzufügen Keine Tags, Fügen Sie den ersten Tag hinzu!

Beschreibung
Zusammenfassung:	The objective of the present invention is to provide a method for expanding a sheath and a bulk of plasma by using a dual high frequency for expanding a sheath and a bulk of plasma generated as a microwave. According to an embodiment of the present invention, the method for expanding a sheath and a bulk of plasma by using a dual high frequency comprises: a generation step of generating plasma by using a microwave plasma generator; and an expansion step of applying a radio frequency (RF) to an RF electrode arranged to be separated from the microwave plasma generator by a set distance so as to expand a sheath and a bulk of the plasma. 본 발명의 목적은 마이크로파로 생성된 플라즈마의 시스와 벌크를 확장하는 이중의 고주파수를 이용한 플라즈마의 시스와 벌크의 확장방법을 제공하는 것이다. 본 발명의 일 실시예에 따른 이중의 고주파수를 이용한 플라즈마의 시스와 벌크의 확장방법은, 마이크로파 플라즈마 발생기로 플라즈마를 생성하는 생성단계, 및 상기 마이크로파 플라즈마 발생기와 설정 간격으로 이격 배치되는 무선주파수 전극에 무선주파수(RF)를 바이어스 인가하여 상기 플라즈마의 시스와 벌크를 확장하는 확장단계를 포함한다.