Mask

The present invention relates to a mask for reducing a cosmetic material present on the face of a wearer to be stained on a mask. The mask includes an embossed shape on a surface of lining, wherein the lining includes a low density non-woven fabric having the density of 0.001 to 0.095 g/cm^3. 본 발명의...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: HER HWAN, WON JUNG HEE, LEE JEONG RAE, KIM KEUM OK, LEE SANG MIN
Format: Patent
Sprache:eng ; kor
Schlagworte:
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Beschreibung
Zusammenfassung:The present invention relates to a mask for reducing a cosmetic material present on the face of a wearer to be stained on a mask. The mask includes an embossed shape on a surface of lining, wherein the lining includes a low density non-woven fabric having the density of 0.001 to 0.095 g/cm^3. 본 발명의 일 실시예에 따른 마스크는 사용자의 호흡기를 덮으며 안감의 표면에 엠보 형상을 포함하는 것을 특징으로 한다.