HARDMASK COMPOSITION AND METHOD OF FORMING PATTERNS

The present invention relates to a hard mask composition comprising: a polymer including a structural unit represented by chemical formula 1; and a solvent, and to a pattern forming method using the hard mask composition. The hard mask composition has excellent heat resistance and etching resistance...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	YOON, BYE RI, PARK, YOU JUNG, LIM, SANG HAK
Format:	Patent
Sprache:	eng ; kor
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES
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