POLYETHYLENE RESIN COMPOSITION AND FILM COMPRISING THE SAME

A polyethylene resin composition for a film of the present invention comprises, based on 100 parts by weight of a basic resin comprising (A) 80 to 90 wt% of a high-density polyethylene polymer having 0.03 to 0.100 g/10min of a melt index (190°C, 2.16kg) and 0.950 to 0.960 g/cm^3 of a density, and (B...

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Bibliographische Detailangaben
Hauptverfasser: KO HWAN HO, YOU JAE MYOUNG, CHA SANG HUN, YOON CHAN SEOG
Format: Patent
Sprache:eng ; kor
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Zusammenfassung:A polyethylene resin composition for a film of the present invention comprises, based on 100 parts by weight of a basic resin comprising (A) 80 to 90 wt% of a high-density polyethylene polymer having 0.03 to 0.100 g/10min of a melt index (190°C, 2.16kg) and 0.950 to 0.960 g/cm^3 of a density, and (B) 10 to 20 wt% of a low-density polyethylene polymer having 1.0 to 5.0 g/10min of the melt index (190°C, 2.16kg) and 0.910 to 0.930 g/cm^3 of the density, (C) 0.7 to 2 parts by weight of a benzotriazole-based compound. The present invention has excellent transparency, tensile strength, tearing strength, and elongation. 본 발명의 필름용 폴리에틸렌 수지 조성물은 (A) 용융지수(190℃, 2.16kg)가 0.03~0.100 g/10min 이고, 밀도가 0.950~0.960 g/cm인 고밀도 폴리에틸렌 중합체 80 내지 90 중량%; 및 (B) 용융지수(190℃, 2.16kg)가 1.0~5.0 g/10min 이고, 밀도가 0.910~0.930 g/cm인 저밀도 폴리에틸렌 중합체 10 내지 20 중량%을 포함하는 기초수지 100 중량부에 대하여, (C)벤조트리아졸계 화합물 0.7 내지 2 중량부을 포함한다.