APPARATUS AND METHOD FOR MONITORING SPREADING CONDITION OF COATING MATERIAL

The present invention relates to a method of monitoring a spreading condition of a coating material capable of determining whether or not the position of a dispenser for discharging the coating material toward a substrate is abnormal. The method comprises the steps of: photographing the substrate on...

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Bibliographische Detailangaben
Hauptverfasser:	KOO HYUNG IL, HAN SANG YU, CHO BEOM GEUN
Format:	Patent
Sprache:	eng ; kor
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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Beschreibung
Zusammenfassung:	The present invention relates to a method of monitoring a spreading condition of a coating material capable of determining whether or not the position of a dispenser for discharging the coating material toward a substrate is abnormal. The method comprises the steps of: photographing the substrate on which the coating material is applied through a spin coating process to obtain a substrate image; extracting a plurality of patches from the substrate image; determining whether each of the plurality of patches is normal; and deciding whether the coating material is normally applied to the substrate depending on a determined result. 본 발명의 기술적 사상에 의한 일 양태에 따른 코팅 물질의 도포 상태 모니터링 방법은, 스핀 코팅 공정을 통해 코팅 물질이 도포되는 기판을 촬영하여 기판 영상을 획득하는 단계; 상기 기판의 영상으로부터 복수의 패치들을 추출하는 단계; 상기 복수의 패치들 각각에 대해 정상 여부를 판별하는 단계; 및 상기 판별된 결과에 따라, 상기 기판에 대한 코팅 물질의 정상 도포 여부를 결정하는 단계를 포함한다.