NAIL LACQUER COMPOSITION WITH HYPOSENSITIVITY

The present invention provides a nail lacquer composition which is free from irritant reactive (meth) acrylate monomers such as hydroxyethyl methacrylate (HEMA) and ethyl methacrylate (EMA). In the present invention, the nail lacquer composition includes at least an aliphatic urethane acrylate oligo...

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Bibliographische Detailangaben
1. Verfasser:	KAZUHIRO KAWABATA
Format:	Patent
Sprache:	eng ; kor
Schlagworte:	HUMAN NECESSITIES HYGIENE MEDICAL OR VETERINARY SCIENCE PREPARATIONS FOR MEDICAL, DENTAL, OR TOILET PURPOSES SPECIFIC USE OF COSMETICS OR SIMILAR TOILETPREPARATIONS
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Beschreibung
Zusammenfassung:	The present invention provides a nail lacquer composition which is free from irritant reactive (meth) acrylate monomers such as hydroxyethyl methacrylate (HEMA) and ethyl methacrylate (EMA). In the present invention, the nail lacquer composition includes at least an aliphatic urethane acrylate oligomer, a polyester acrylate oligomer, a low-irritation acrylate monomer, and a photoinitiator. A gel polish composition exhibits little or no irritation to the skin, exhibits excellent adhesion to nails, and is stable for long-term storage under normal storage conditions. 본 발명은 히드록시에틸메타크릴레이트(HEMA) 및 에틸 메타크릴레이트(EMA)와 같은 자극성 반응성 (메트)아크릴레이트 단량체를 함유하지 않는 것을 특징으로 하는 네일 래커 조성물을 제공한다. 본 발명에서, 상기 네일 래커 조성물은 적어도 지방족 우레탄 아크릴레이트 올리고머, 폴리에스테르 아크릴레이트 올리고머, 저 자극성 아크릴레이트 단량체 및 광개시제를 포함한다. 상기 젤 폴리쉬 조성물은 피부에 대한 자극이 적거나 없고, 손톱에 대한 탁월한 접착성을 나타내며, 통상의 저장 조건에서 장기간 저장에 안정하다.