SUBSTRATE PROCESSING APPARATUS SUBSTRATE PROCESSING METHOD AND RECORDING MEDIUM

The thickness of a liquid film of a protective liquid on a front surface of a substrate when being carried in a drying processing unit is maintained within an appropriate range. A substrate processing apparatus includes: at least one liquid film forming unit (16A) configured to form a liquid film of...

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Bibliographische Detailangaben

1. Verfasser:	KIYOSE HIROMI
Format:	Patent
Sprache:	eng ; kor
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
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